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Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques
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Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".

Deadline for manuscript submissions: closed (20 December 2023) | Viewed by 4774

Special Issue Editors

Dr. Nicola Calisi

E-Mail Website
Guest Editor
Department of Industrial Engineering, University of Florence, Firenze, Italy
Interests: thin films; surface characterization; XPS; SEM; perovskites
Dr. Walter Giurlani

E-Mail Website1 Website2
Guest Editor
Department of Chemistry “Ugo Schiff”, University of Florence 3, 50019 Sesto Fiorentino, Italy
Interests: thin film deposition; E-ALD; electrodeposition; electroplating; nanostructured materials; thickness determination; materials science; corrosion; electrocatalysis; material characterization; EDS; XRF; SEM; AFM
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

I am pleased to present this upcoming Special Issue of Materials entitled “Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques”. The focus of this new Special Issue is to group the newest progresses in terms of methodologies and applications of plasma-assisted deposition and pulsed laser deposition techniques.

Materials, when presented in the form of thin films, possess a variety of interesting properties that differ many times from the properties of the larger variety. A thin film can be applied on the surface of an object for a variety of reasons, including:

  • Protective films against environmental corrosion;
  • Film as thermal or chemical shield;
  • Reinforcement films against scratching;
  • Films to decrease the friction coefficient;
  • Esthetical thin films.

In this framework, plasma-assisted and pulsed laser depositions are two relevant techniques for the large-scale production of thin films. In the literature, we can find numerous examples of applications and technical improvements concerning these techniques. Our purpose is to produce a comprehensive collection of papers that can constitute a new starting point for the research community.

Full papers, communications, and reviews are all welcome.

Dr. Nicola Calisi
Dr. Walter Giurlani
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma deposition
  • pulsed laser deposition
  • thin film
  • laser
  • plasma
  • deposition technique

Published Papers (3 papers)

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Research

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14 pages, 5355 KiB  
Article
Effects of Post-Annealing on the Properties of ZnO:Ga Films with High Transparency (94%) and Low Sheet Resistance (29 Ω/square)
by Li-Wen Wang and Sheng-Yuan Chu
Materials 2023, 16(19), 6463; https://doi.org/10.3390/ma16196463 - 28 Sep 2023
Cited by 1 | Viewed by 867
Abstract
This study presents gallium-doped zinc oxide (ZnO:Ga, GZO) thin films. GZO thin films with both high transparency and low sheet resistance were prepared by RF sputtering and then post-annealed under nitrogen and hydrogen forming gas. With post-annealing at 450 °C, the proposed films [...] Read more.
This study presents gallium-doped zinc oxide (ZnO:Ga, GZO) thin films. GZO thin films with both high transparency and low sheet resistance were prepared by RF sputtering and then post-annealed under nitrogen and hydrogen forming gas. With post-annealing at 450 °C, the proposed films with a film thickness of 100 nm showed high transparency (94%), while the sheet resistance of the films was reduced to 29 Ω/square, which was comparable with the performances of commercial indium tin oxide (ITO) samples. Post-annealing under nitrogen and hydrogen forming gas enhanced the films’ conductivity while altering the thin-film composition and crystallinity. Nitrogen gas played a role in improving the crystallinity while maintaining the oxygen vacancy of the proposed films, whereas hydrogen did not dope into the thin film, thus maintaining its transparency. Furthermore, hydrogen lowered the resistance of GZO thin films during the annealing process. Then, the detailed mechanisms were discussed. Hydrogen post-annealing helped in the removal of oxygen, therefore increasing the Ga3+ content, which provided extra electrons to lower the resistivity of the films. After the preferable nitrogen/hydrogen forming gas treatment, our proposed films maintained high transparency and low sheet resistance, thus being highly useful for further opto-electronic applications. Full article
(This article belongs to the Special Issue Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques)
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15 pages, 5912 KiB  
Article
Magnetron Sputtering Deposition of High Quality Cs3Bi2I9 Perovskite Thin Films
by Stefano Caporali, Stefano Mauro Martinuzzi, Lapo Gabellini and Nicola Calisi
Materials 2023, 16(15), 5276; https://doi.org/10.3390/ma16155276 - 27 Jul 2023
Viewed by 960
Abstract
Nontoxic all-inorganic perovskites are among the most promising materials for the realization of optoelectronic devices. Here, we present an innovative way to deposit lead-free, totally inorganic Cs3Bi2I9 perovskite from vapor phase. Taking use of a magnetron sputtering system [...] Read more.
Nontoxic all-inorganic perovskites are among the most promising materials for the realization of optoelectronic devices. Here, we present an innovative way to deposit lead-free, totally inorganic Cs3Bi2I9 perovskite from vapor phase. Taking use of a magnetron sputtering system equipped with a radiofrequency working mode power supply and a single target containing the correct ratio of CsI and BiI3 salts, it was possible to deposit a Cs3Bi2I9 perovskitic film on silicon and soda-lime glass. The target composition was optimized to obtain a stoichiometric deposition, and the best compromise was found with a mix enriched with 20% w/w of CsI. Secondly, the effect of post-deposition thermal treatments (150 °C and 300 °C) and of the deposition on a preheat substrate (150 °C) were evaluated by analyzing the chemical composition, the morphology, the crystal structure, and the optical properties. The thermal treatment at 150 °C improved the uniformity of the perovskite film; the one at 300 °C damaged the perovskite deposited. Depositing on a preheated substrate at 150 °C, the obtained film showed a higher crystallinity. An additional thermal treatment at 150 °C on the film deposed on the preheated substrate showed that the crystallinity remains high, and the morphology becomes more uniform. Full article
(This article belongs to the Special Issue Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques)
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Review

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30 pages, 3953 KiB  
Review
PVD for Decorative Applications: A Review
by Mariya Vorobyova, Fabio Biffoli, Walter Giurlani, Stefano Mauro Martinuzzi, Maximilian Linser, Andrea Caneschi and Massimo Innocenti
Materials 2023, 16(14), 4919; https://doi.org/10.3390/ma16144919 - 10 Jul 2023
Cited by 5 | Viewed by 2551
Abstract
Physical Vapor Deposition (PVD) is a widely utilized process in various industrial applications, serving as a protective and hard coating. However, its presence in fields like fashion has only recently emerged, as electroplating processes had previously dominated this reality. The future looks toward [...] Read more.
Physical Vapor Deposition (PVD) is a widely utilized process in various industrial applications, serving as a protective and hard coating. However, its presence in fields like fashion has only recently emerged, as electroplating processes had previously dominated this reality. The future looks toward the replacement of the most hazardous and toxic electrochemical processes, especially those involving Cr(VI) and cyanide galvanic baths, which have been restricted by the European Union. Unfortunately, a complete substitution with PVD coatings is not feasible. Currently, the combination of both techniques is employed to achieve new aesthetic features, including a broader color range and diverse textures, rendering de facto PVD of primary interest for the decorative field and the fashion industry. This review aims to outline the guidelines for decorative industries regarding PVD processes and emphasize the recent advancements, quality control procedures, and limitations. Full article
(This article belongs to the Special Issue Advances in Thin-Film Deposition via Plasma-Assisted and Pulsed Laser Techniques)
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