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Magnetochemistry
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Magnetron Sputtering Process
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Magnetron Sputtering Process

A special issue of Magnetochemistry (ISSN 2312-7481). This special issue belongs to the section "Magnetic Field".

Deadline for manuscript submissions: closed (20 May 2023) | Viewed by 7654

Special Issue Editor

Dr. Zhengtao Wu

E-Mail Website
Guest Editor
School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China
Interests: PVD thin films; plasma detection; in situ nanoindentation

Special Issue Information

Dear Colleagues,

Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical properties of refractory ceramic thin films grown at low temperatures by magnetron sputtering. However, in contrast to gas-ion bombardment, the effects of metal-ion irradiation on properties of refractory ceramic thin films have not been extensively studied due to (i) low metal-ion concentrations (a few percentage points) during standard direct-current magnetron sputtering (DCMS) and (ii) difficulties in separating metal-ion from gas-ion fluxes. Recently, the situation has changed dramatically thanks to the development of high-power impulse magnetron sputtering (HiPIMS), which provides highly ionized metal-ion plasmas. The discussion of this topic covers aspects ranging from the plasma measurements of the sputtering process to applications of magnetron-sputtered thin films. This Special Issue reviews the current status and future perspectives of the magnetron sputtering technique.

Dr. Zhengtao Wu
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Magnetochemistry is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2700 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • PVD thin films
  • mechanical properties
  • wear resistance
  • oxidation resistance
  • protection
  • stability
  • plasma properties

Published Papers (4 papers)

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Research

19 pages, 7038 KiB  
Article
A Comparative Investigation on the Microstructure and Thermal Resistance of W-Film Sensor Using dc Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering
by Jing Huan, Zhengtao Wu, Qimin Wang, Shihong Zhang and Se-Hun Kwon
Magnetochemistry 2023, 9(4), 97; https://doi.org/10.3390/magnetochemistry9040097 - 31 Mar 2023
Cited by 2 | Viewed by 1908
Abstract
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron-sputtered films. High-power pulsed magnetron [...] Read more.
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron-sputtered films. High-power pulsed magnetron sputtering (HiPIMS) technology is a physical vapor deposition technology with a high ionization rate and high energy. Therefore, in this work, HiPIMS was applied to prepare metallic tungsten films and compare the surface morphology and microstructure of metallic tungsten films deposited using HiPIMS and dc magnetron sputtering (dcMS) technology under different pulse lengths, as well as related thermal resistance performance, followed by annealing treatment for comparative analysis. We used AFM, SEM, XRD, and plasma characterization testing to comprehensively analyze the changes in the TCR value, stability, repeatability and other related performance of the metallic tungsten thin-film sensor deposited by the HiPIMS technology. It was determined that the thin film prepared by the HiPIMS method is denser, with fewer defects, and the film sensor was stable. The 400 °C annealed sample prepared using HiPIMS with a 100 μs pulse length reaches the largest recorded TCR values of 1.05 × 10−3 K−1. In addition, it shows better stability in repeated tests. Full article
(This article belongs to the Special Issue Magnetron Sputtering Process)
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0 pages, 9067 KiB  
Article
Dry Friction Performances of MoNx Coatings Deposited by High–Power Pulsed Magnetron Sputtering
by Fuqiang Li, Wei Dai, Qimin Wang, Haiqing Li and Zhengtao Wu
Magnetochemistry 2023, 9(3), 60; https://doi.org/10.3390/magnetochemistry9030060 - 23 Feb 2023
Cited by 1 | Viewed by 1356 | Correction
Abstract
A MoNx coating serves as an effective wear protection layer and is crucial for the investigation of its tribological characteristics at various temperatures. This study examined the tribological characteristics of MoNx coatings that were deposited through high-power pulsed magnetron sputtering (HiPIMS) [...] Read more.
A MoNx coating serves as an effective wear protection layer and is crucial for the investigation of its tribological characteristics at various temperatures. This study examined the tribological characteristics of MoNx coatings that were deposited through high-power pulsed magnetron sputtering (HiPIMS) in an Ar/N2 environment with varying N2 partial pressures. The microstructures and mechanical properties of the coatings were elucidated using scanning electron microscopy, grazing-incidence-angle X-ray diffraction, energy-dispersive spectroscopy, and nanoindentation. The dry friction performances of the coatings at different heating temperatures were studied using a ball-on-disk tribometer. The MoNx coating produced by HiPIMS was composed primarily of fcc−Mo2N and featured a fine, dense column crystal with a maximum hardness of 28.8 GPa. The MoNx coatings exhibited excellent lubrication and wear reduction properties at room temperature (RT). The dry friction performances of the MoNx coatings at elevated temperatures were expected to depend on the growth of the MoO3 tribolayer. At relatively low temperatures (300 °C and 400 °C), the MoO3 tribolayer grew slowly and was not enough to provide good lubrication, causing increases in the dry friction of the coatings. However, the δ−MoN phase formed in the MoNx coating deposited at a high N2 partial pressure could facilitate the formation of MoO3 and thus decreased the friction coefficient at 400 °C. At the relatively high heating temperature of 500 °C, however, the MoO3 tribolayer grew so rapidly that the oxide layer became thick, resulting in an increase in the wear rate. It is believed that tuning the growth rate of MoO3 via optimizing the composition and structure of the MoNx coatings might be a useful way to improve the dry friction at various elevated temperatures. Full article
(This article belongs to the Special Issue Magnetron Sputtering Process)
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19 pages, 4178 KiB  
Article
Amorphous Carbon Films with Embedded Well-Dispersed Nanodiamonds: Plasmon-Enhanced Analysis and Possible Antimicrobial Applications
by Oleg Streletskiy, Elena Perevedentseva, Ilya Zavidovskiy, Artashes Karmenyan, Vladimir Sychev, Vera Sadykova, Anastasia Kuvarina and Chia-Liang Cheng
Magnetochemistry 2022, 8(12), 171; https://doi.org/10.3390/magnetochemistry8120171 - 26 Nov 2022
Cited by 6 | Viewed by 2313
Abstract
An amorphous carbon film with embedded detonation nanodiamond (DND) particles (a-C:ND) was produced by magnetron sputtering of nanodiamond powder. An Ag film was deposited on the carbon structure by radiofrequency magnetron sputtering. The silver film was irradiated with a 150 eV Ar+ [...] Read more.
An amorphous carbon film with embedded detonation nanodiamond (DND) particles (a-C:ND) was produced by magnetron sputtering of nanodiamond powder. An Ag film was deposited on the carbon structure by radiofrequency magnetron sputtering. The silver film was irradiated with a 150 eV Ar+ to form plasmonic-active nanoparticles (NP) on the surface of the a-C:ND. The structure of the obtained a-C:ND and a-C:ND/Ag structures were studied by scanning and transmission electron microscopy, electron energy-loss spectroscopy, UV–Visible absorption spectroscopy, Raman spectroscopy, and fluorescence lifetime imaging at two-photon excitation. The analysis revealed 76% of sp3-carbon and a good dispersion of diamond nanoparticles in the a-C. Surface-enhanced Raman scattering (SERS) was applied to investigate the a-C:ND/Ag structure, allowing for the observation of SERS from the sp2-carbon species and the absence of significant a-C:ND damage after Ar+ irradiation of the Ag overlayer. A plasmonic-metal-enhanced luminescence was observed at one- and two-photon excitations, revealing a two- to five-fold intensity increase. The activity of the used DNDs was tested using the agar diffusion method and observed against the bacteria of Bacillus subtilis, Staphylococcus aureus, and Escherichia coli and the fungi of Aspergillus niger, Aspergillus fumigatus, and the yeast of Candida albicans, showing DND activity against all the test strains of fungi. Full article
(This article belongs to the Special Issue Magnetron Sputtering Process)
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Graphical abstract

7 pages, 1742 KiB  
Communication
A Comparative Investigation of Mechanical Properties of TiB2/Cr Multilayer Film by Indentation
by Simeng Chen, Zhengtao Wu and Qimin Wang
Magnetochemistry 2022, 8(11), 148; https://doi.org/10.3390/magnetochemistry8110148 - 07 Nov 2022
Viewed by 1419
Abstract
Alternating TiB2-dcMS and Cr-HiPIMS layers are used to fabricate TiB2/Cr multilayer films. Introducing a 5-nm-thick Cr interlayer deposited under a substrate bias of −60 V produces slight increases in both film hardness and elastic modulus. The TEM observation indicates [...] Read more.
Alternating TiB2-dcMS and Cr-HiPIMS layers are used to fabricate TiB2/Cr multilayer films. Introducing a 5-nm-thick Cr interlayer deposited under a substrate bias of −60 V produces slight increases in both film hardness and elastic modulus. The TEM observation indicates that the Cr grains favor epitaxial growth on the TiB2 interlayer, forming a coherent TiB2/Cr interface. This improves hardness. Mechanic measurement by using AFM illustrates that the coherent interface increases the elastic modulus of the Cr up to ~280 GPa, which is significantly higher than bulk material. Full article
(This article belongs to the Special Issue Magnetron Sputtering Process)
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