Advances in Optical Metrology
A special issue of Photonics (ISSN 2304-6732).
Deadline for manuscript submissions: closed (15 February 2022) | Viewed by 15732
Special Issue Editors
2. Large Binocular Telescope Observatory, University of Arizona, Tucson, AZ 85721, USA
Interests: optical testing/metrology; wavefront analysis; large optics fabrication; optical design; opto- mechanics; numerical simulation; adaptive optics; optical system alignment; LiDAR
Interests: adaptive optics; wavefront sensor; instrumentation; adaptive interferometric metrology; optical system design; application technologies
Special Issues, Collections and Topics in MDPI journals
Interests: generation of optical systems; optical fabrication and testing technologies; glass; polishing sciences; project management; three wagons method; computational simulation of fabrication processes; kendo;
Special Issue Information
Dear Colleagues,
We are pleased to invite you to submit a manuscript to the Photonics Special Issue ‘Advances in Optical Metrology’. This Special Issue is focused on the advanced optical metrology for academia and industrial optics systems. In order to meet the demand of extreme optical performance needs, optical designers and opticians have developed a unique design model and fabrication approach for challenging surface figures. Because the understanding of target and sample are fundamental steps for planning the entire fabrication process and quality check, those extreme optics developments are always based on the established metrology limits.
Our scope includes all the challenges of metrology—from the optics of large space telescopes to the small optic systems of cellphone camera lenses. With regard to the methodology, this Special Issue aims to encompass methods using a Fizeau interferometer, a low coherence interferometer, frequency comb distance measurement, a physical contact profilometer, deflectometer, fringe projection, photogrammetry, and all possible methods for optical testing. As the above approaches adopt the unique mathematical model, data process modeling methods, such as dimensional data, surface reconstruction, tolerance, and error analysis, are also within the scope of this Special Issue.
The impact of this Special Issue is in providing insights into the latest challenges in optical metrology in various fields and to educate stakeholders throughout the optics community. We hope that the comprehensive pieces of knowledge gathered over the distinctive applications in this field encourage the sui generis answers for challenges that have not yet been resolved or that remain understudied.
Dr. Heejoo Choi
Dr. Lei Huang
Dr. Oliver Faehnle
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- optical metrology
- optical surface testing
- wavefront sensing and analysis
- interferometer
- profilometer
- deflectometer
- optical instrumentation
- adaptive optics
- numerical data process
- optical alignment
- optical inspection