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Applied Sciences
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Advances in Optical Instrument and Measurement Technology
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Advances in Optical Instrument and Measurement Technology

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Optics and Lasers".

Deadline for manuscript submissions: 31 August 2024 | Viewed by 1456

Special Issue Editors

Prof. Dr. Zhan Gao

E-Mail Website
Guest Editor
Key Laboratory of Luminescence and Optical Information of Ministry of Education, Beijing Jiaotong University, Beijing 100044, China
Interests: photoelectric detection and photoelectric sensing; interferometry; speckle metrology; machine vision measurement
Dr. Jiakun Li

E-Mail Website
Guest Editor
School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
Interests: photoelectric detection and photoelectric sensing; laser measurement; machine vision measurement; gas imaging detection
Special Issues, Collections and Topics in MDPI journals
Dr. Qixin He

E-Mail Website
Guest Editor
School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
Interests: laser measurement; laser sensing; infrared gas detection
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

In recent years, with the development of laser sources, measurement approaches and new materials, many new technologies or applications of measurement and new optical instruments have appeared. Therefore, this Special Issue is intended for the presentation of new ideas and experimental results in the field of high-performance optical instruments and measurement technology. Potential topics include, but are not limited to: optical design, fabrication and testing; ultrafast optic development; computational optical imaging; analog image processing with optical metasurfaces and metamaterials; novel techniques in microscopy; fiber-optic sensors; laser measurement; digital holographic metrology and sensing; micro- and nanophotoelectric measurement.

Prof. Dr. Zhan Gao
Dr. Jiakun Li
Dr. Qixin He
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • optical design, fabrication and testing
  • applied industrial optics
  • computational optical imaging
  • novel techniques in microscopy
  • biosensors
  • optical manipulation and its applications
  • advances in meta-optics and metasurfaces
  • hyperspectral and multispectral imaging
  • new ultrafast laser applications
  • digital holographic metrology
  • LIDAR
  • laser measurement
  • micro‐ and nano photoelectric measurement

Published Papers (3 papers)

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Research

15 pages, 7816 KiB  
Article
The Microchip Laser and Its Drive Control System for Planetary Mass Spectrometry Measurements
by Wenbo Liu, Peng Sang, Yang Cao, Yaning Liu, Huan Wang and Baoquan Li
Appl. Sci. 2024, 14(8), 3251; https://doi.org/10.3390/app14083251 - 12 Apr 2024
Viewed by 284
Abstract
To fulfill the requisites of planetary mass spectrometry applications, this paper introduces the creation of a miniaturized, low-power passive Q-switched microchip laser system. The entire system, inclusive of the laser and all electronic components, weighs 106 g, with power consumption below 3 W. [...] Read more.
To fulfill the requisites of planetary mass spectrometry applications, this paper introduces the creation of a miniaturized, low-power passive Q-switched microchip laser system. The entire system, inclusive of the laser and all electronic components, weighs 106 g, with power consumption below 3 W. The laser output exhibits a pulse duration of 410 ps, accompanied by a single pulse energy of 16.8 μJ. Augmented by the optical focusing system, the system attains a focal spot size of approximately 15 μm and laser irradiance of up to 22 GW/cm2. The driving control system facilitates versatile regulation of parameters such as output current amplitude, pulse duration, and frequency, thereby modulating the laser output frequency and duty cycle. The microchip laser fully meets the power requirements for exciting plasma from planetary rocks and soil. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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8 pages, 2156 KiB  
Communication
Efficient Method for Identifying Key Errors Based on 21-Geometric-Error Measurement of Three Linear Axes of Machine Tools
by Fajia Zheng, Bin Zhang, Yuqiong Zhao, Jiakun Li, Fei Long and Qibo Feng
Appl. Sci. 2024, 14(7), 2982; https://doi.org/10.3390/app14072982 - 02 Apr 2024
Viewed by 414
Abstract
Key errors of machine tools have a significant impact on their accuracy, however accurately and quickly measuring the geometric errors of machine tools is essential for key error identification. Fortunately, a quick and direct laser measurement method and system for 21 geometric errors [...] Read more.
Key errors of machine tools have a significant impact on their accuracy, however accurately and quickly measuring the geometric errors of machine tools is essential for key error identification. Fortunately, a quick and direct laser measurement method and system for 21 geometric errors of three linear axes of machine tools were proposed previously, which enables the measurement of all 21 geometric errors via a one-step installation and a three-step automated measurement process. Based on this, to efficiently identify the key error factors, this paper first utilizes the 21 geometric errors obtained from the proposed measurement system to evaluate the contribution of each error to the volumetric errors of machine tools, leading to the building of a 21-geometric-error sensitivity analysis model. Then, experiments are carried out on the vertical machining tool TH5656, and all 21 geometric errors are obtained in 5 min. After this, the volumetric error distribution in the machining workspace is mapped according to the relationship between the geometric errors and the machining errors, and the key error factors affecting the manufacturing and machining accuracy of the TH5656 are ultimately determined. Thus, this new method provides a way to quickly identify key errors of the three linear axes of machine tools, and offers guidance for the machine tool configuration design, machining technology determination, and geometric error compensation. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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14 pages, 5672 KiB  
Article
An Iterative High-Precision Algorithm for Multi-Beam Array Stitching Method Based on Scanning Hartmann
by Xiangyu Yan, Dahai Li, Kewei E, Fang Feng, Tao Wang, Xun Xue, Zekun Zhang and Kai Lu
Appl. Sci. 2024, 14(2), 794; https://doi.org/10.3390/app14020794 - 17 Jan 2024
Viewed by 420
Abstract
The multi-beam array stitching test system (MASTS) based on the Hartmann principle is employed to measure the aberrations in large-aperture optical systems. As each small-aperture and ideal parallel beam traverses the optical system, it is converged into a spot at the focal plane [...] Read more.
The multi-beam array stitching test system (MASTS) based on the Hartmann principle is employed to measure the aberrations in large-aperture optical systems. As each small-aperture and ideal parallel beam traverses the optical system, it is converged into a spot at the focal plane of the optical system. The centroid position of the spot contains the information about the wavefront slope of the sub-aperture at that specific location in the optical system. Scanning the optical system with this small-aperture beam across the entire aperture of the optical system, we can yield the aberration information to be tested. To mitigate pointing errors induced by scanning motion and accurately obtain the aberration signals of the optical system, nine beams are integrated into a 3 × 3 multi-beam array system, and their directions are aligned to be identical. However, achieving complete alignment in the same direction for all nine beams is a challenging task, resulting in errors due to their pointing differences within the array. This paper introduces an iterative algorithm designed to obtain high-precision multi-beam pointing errors and to reconstruct the wavefront of the optical system under test. This enables a more accurate measurement of wavefront aberrations in the optical system to be tested. Firstly, simulation models were implemented to validate the algorithm’s feasibility. Additionally, a scanning optical measurement system with a multi-beam array was developed in our lab, and the iterative algorithm was applied to process our experimental data. The results were then compared with interferometer data, demonstrating that our algorithm is feasible for MASTS to measure aberrations in large-aperture optical systems with high accuracy. Full article
(This article belongs to the Special Issue Advances in Optical Instrument and Measurement Technology)
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