In this work, the structural, optical, morphological, and sensing features of tungsten oxide (WO
3) thin film deposited on a silicon substrate via hot-filament chemical vapor deposition (HFCVD) are described. The experimental characterization tools, such as X-ray diffraction (XRD), field emission scanning
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In this work, the structural, optical, morphological, and sensing features of tungsten oxide (WO
3) thin film deposited on a silicon substrate via hot-filament chemical vapor deposition (HFCVD) are described. The experimental characterization tools, such as X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), ultraviolet-visible (UV-Vis), and Fourier transform infra-red (FTIR) spectroscopies, etc., were used to determine the properties of WO
3 NPys thin films. The grown WO
3 thin film illustrated closely packed porous pyramidal nanostructures (NPys) of improved grain size properties. The diffraction analysis revealed (100) and (200) of WO
3 phases, suggesting the classic monoclinic crystal WO
3 structure. HFCVD grown WO
3 NPys thin film was employed as electro-active electrode for detecting ethylenediamine in 10 mL of 0.1 M phosphate buffer solution (PBS) by varying the ethylenediamine concentrations from 10 μM to 200 μM at room temperature. With a detection of limit (LOD) of ~9.56 μM, and a quick reaction time (10 s), the constructed chemical sensor achieved a high sensitivity of ~161.33 μA μM
−1 cm
−2. The durability test displayed an excellent stability of electrochemical sensor by maintaining over 90% sensitivity after 4 weeks of operation. This work provides a strategy for a facile preparation of WO
3 NPys thin film electrode for sensor applications.
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