Development of Thin Film Fabrication Using Magnetron Sputtering
A special issue of Metals (ISSN 2075-4701).
Deadline for manuscript submissions: closed (31 July 2023) | Viewed by 1360
Special Issue Editor
Special Issue Information
Dear Colleagues,
Due to their versatility, thin metal films are being used in many modern technologies such as optoelectronics, microelectronics, catalysis, energy conversion and storage, sensors, actuators, and food packaging. Also, thin metal nanofilms have potentially used in applications relevant to other fields as bio- and nanopore sensors, nanomedicine, and voltage-charging separations. Thin metal films used in the many modern technological applications should satisfy very strict technical requirements relating to metal deposition method. The enabling of thin metal films to these applications, the uniformity, grain size, morphology, and porosity of thin metal films has critical roles. It is well known that the process used for the deposition of the metallic film has a critical role in the specifications of the coated metallic film. Among the metallic coating methods, sputtering has attracted much attention today. Journal of Metal aimed to publish a special issue about the sputtered metallic films. In this issue, we are looking for a manuscript that covers the following topics:
- Granular metallic films for superconductivity
- Thin metallic films for catalytic application
- Ultra-thin metallic films for optical transparency
- Thin metal films for tunable optical mirrors
This issue provides an excellent opportunity to review the examined previously unaddressed aspects, propose and develop new approaches.
Dr. Morteza Sasani Ghamsari
Guest Editor
Manuscript Submission Information
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Keywords
- sputtering process
- transparent electrode
- plasmonic
- superconductivity
- metasurface
- phase shifters
- ferromagnetic metallic films
- optical mirrors
