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Thin Films Prepared by Wet-Chemical Solution Processes
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Thin Films Prepared by Wet-Chemical Solution Processes

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Materials Chemistry".

Deadline for manuscript submissions: closed (31 December 2021) | Viewed by 8779

Special Issue Editor

Prof. Dr. Yun-Hyuk Choi

E-Mail Website
Guest Editor
School of Advanced Materials and Chemical Engineering, Catholic University of Daegu, Gyeongsan, Korea
Interests: thin-film processing; solution process; thin-film growth mechanism; printed electronics; sol–gel; metallo-organic deposition

Special Issue Information

Dear Colleagues,

Thin-film materials have been used in various electronic and energy applications, such as thin-film transistors, sensors, solar cells, and batteries. The fabrication of thin films can be achieved using vacuum-assisted and solution-processed techniques. In this Special Issue, the interests center around wet-chemical solution processes. Materials chemistry and physics for thin-film processing can be represented with a variety of purposes. In particular, ink chemistry for printed electronics, sol–gel processing, and metallo-organic deposition (MOD) techniques are welcomed. In addition, thin-film growth mechanisms should be suggested and demonstrated.

It is my pleasure to invite you to submit a manuscript for this Special Issue. Full papers, communications, and reviews are all welcome.

Prof. Dr. Yun-Hyuk Choi
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin films
  • solution process
  • printed electronics
  • sol–gel
  • metallo-organic deposition (MOD)
  • electronics
  • energy convergence
  • energy storage

Published Papers (3 papers)

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Research

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8 pages, 8911 KiB  
Article
Fabrication of Single-Phase Manganese Oxide Films by Metal-Organic Decomposition
by Kyung-Hwan Kim, Do Kyung Lee and Yun-Hyuk Choi
Materials 2021, 14(9), 2338; https://doi.org/10.3390/ma14092338 - 30 Apr 2021
Cited by 6 | Viewed by 2445
Abstract
Here, single-phase Mn2O3 and Mn3O4 films are successfully fabricated by a facile solution process based on metal-organic decomposition (MOD), for the first time. A formulated manganese 2-ethylhexanoate solution was used as an MOD precursor for the preparation [...] Read more.
Here, single-phase Mn2O3 and Mn3O4 films are successfully fabricated by a facile solution process based on metal-organic decomposition (MOD), for the first time. A formulated manganese 2-ethylhexanoate solution was used as an MOD precursor for the preparation of manganese oxide films. The difference in thermal decomposition behavior of precursor solution in air and inert atmospheres was observed, indicating that the calcination atmosphere is the main factor for controlling the valence of manganese oxide films. Significantly, the solution-coated films on substrates are found to be transformed into single-phase Mn2O3 and Mn3O4 films when they are calcinated under air and inert atmosphere, respectively. The film crystallinity was improved with increasing calcination temperature for both Mn2O3 and Mn3O4 films. In particular, it is noted that the grains of Mn2O3 film were somewhat linearly grown in air, while those of Mn3O4 film exhibited the drastic growth in Ar with an increase of calcination temperature. Full article
(This article belongs to the Special Issue Thin Films Prepared by Wet-Chemical Solution Processes)
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9 pages, 3242 KiB  
Article
Fabrication of Transparent Mg(OH)2 Thin Films by Drop-Dry Deposition
by Tong Li and Masaya Ichimura
Materials 2021, 14(4), 724; https://doi.org/10.3390/ma14040724 - 04 Feb 2021
Cited by 10 | Viewed by 2148
Abstract
Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of [...] Read more.
Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH)2 thin films were researched. Films with a thickness of 1−2 μm were successfully deposited, and the Raman peaks of Mg(OH)2 were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 105 Ωcm. Thus, the transparent and semiconducting Mg(OH)2 thin films were successfully prepared by DDD. Full article
(This article belongs to the Special Issue Thin Films Prepared by Wet-Chemical Solution Processes)
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Review

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18 pages, 5893 KiB  
Review
Hydrophobic Thin Films from Sol–Gel Processing: A Critical Review
by Matteo Poddighe and Plinio Innocenzi
Materials 2021, 14(22), 6799; https://doi.org/10.3390/ma14226799 - 11 Nov 2021
Cited by 16 | Viewed by 3359
Abstract
Fabrication of hydrophobic thin films from a liquid phase is a hot topic with critical technological issues. Interest in the production of hydrophobic surfaces is growing steadily due to their wide applications in several industrial fields. Thin films from liquid phases can be [...] Read more.
Fabrication of hydrophobic thin films from a liquid phase is a hot topic with critical technological issues. Interest in the production of hydrophobic surfaces is growing steadily due to their wide applications in several industrial fields. Thin films from liquid phases can be deposited on different types of surfaces using a wide variety of techniques, while the design of the precursor solution offers the possibility of fine-tuning the properties of the hydrophobic coating layers. A general trend is the design of multifunctional films, which have different properties besides being hydrophobic. In the present review, we have described the synthesis through sol–gel processing of hydrophobic films enlightening the main achievements obtained in the field. Full article
(This article belongs to the Special Issue Thin Films Prepared by Wet-Chemical Solution Processes)
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