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Coatings
Special Issues
Recent Advances in Chemical Vapor Deposition
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Recent Advances in Chemical Vapor Deposition

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 31 March 2025 | Viewed by 1194

Special Issue Editors

Prof. Dr. Mingheng Li

E-Mail Website
Guest Editor
Department of Chemical and Materials Engineering, California State Polytechnic University, Pomona, CA 91768, USA
Interests: chemical vapor deposition; membrane processes; water desalination; adsorption; process systems engineering (design, simulation, control, and optimization)
Special Issues, Collections and Topics in MDPI journals
Prof. Dr. Yong X. Gan

E-Mail Website
Guest Editor
Department of Mechanical Engineering, California State Polytechnic University, Pomona, CA 91768, USA
Interests: nanotechnology; materials processing; manufacturing; mechanical design
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Chemical Vapor Deposition (CVD) is a versatile technique used to deposit high-quality films and coatings from gaseous precursors. It is widely applied to semiconductors, solar cells, glass coatings, LEDs, and sensors, to name a few. This Special Issue of Coatings on “Recent Advances in Chemical Vapor Deposition” is intended to cover original research and critical review articles on recent advances in all aspects of CVD. The topics of interest include, but are not limited to:

  • CVD techniques;
  • High-temperature CVD;
  • Ambient-pressure CVD;
  • Low-temperature CVD;
  • Plasma-enhanced CVD;
  • Atomic layer deposition;
  • The characterization of CVD thin film;
  • Transport in CVD processes;
  • CVD process modeling, optimization and control;
  • Applications of CVD.

Prof. Dr. Mingheng Li
Prof. Dr. Yong X. Gan
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • CVD
  • thin films
  • characterization
  • structure

Published Papers (1 paper)

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Research

18 pages, 4613 KiB  
Article
Machine Learning Modeling and Run-to-Run Control of an Area-Selective Atomic Layer Deposition Spatial Reactor
by Matthew Tom, Henrik Wang, Feiyang Ou, Gerassimos Orkoulas and Panagiotis D. Christofides
Coatings 2024, 14(1), 38; https://doi.org/10.3390/coatings14010038 - 27 Dec 2023
Viewed by 926
Abstract
Semiconducting materials require stringent design specifications that make their fabrication more difficult and prone to flaws that are costly and damaging to their computing and electrical properties. Area-selective atomic layer deposition is a process that addresses concerns associated with design imperfections but requires [...] Read more.
Semiconducting materials require stringent design specifications that make their fabrication more difficult and prone to flaws that are costly and damaging to their computing and electrical properties. Area-selective atomic layer deposition is a process that addresses concerns associated with design imperfections but requires substantial monitoring to ensure that process regulation is maintained. This work proposes a run-to-run controller with an exponentially weighted moving average method for an area-selective atomic layer deposition rotary reactor by adjusting the rotation speed of the substrate to control the growth per cycle of the wafer, which is calculated through a multiscale model with machine learning integration for pressure field generation and kinetic Monte Carlo simulations to increase computational efficiency. Results indicate that the run-to-run controller was able to bring the process to the setpoint when subjected to moderate pressure and kinetic shift disturbances. Full article
(This article belongs to the Special Issue Recent Advances in Chemical Vapor Deposition)
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