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Advances in Plasma and Laser Engineering (Second Edition)

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Advanced Materials Characterization".

Deadline for manuscript submissions: 20 July 2024 | Viewed by 124

Special Issue Editor


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Guest Editor

Special Issue Information

Dear Colleagues,

This Special Issue of Materials is intended to provide a description of devices and processes related to the advances in plasma and laser engineering. Plasma is called the fourth state of matter because its properties differ significantly from those of ordinary gas. Plasma can be considered a conductive medium generated by the ionization of gases. Therefore, it occurs as a mixture of photons, electrons, and ions, but it can also contain neutral atoms and molecules. The concept of plasma includes media with very different properties because the composition, densities, and kinetic energies of plasma components differ for various types of plasma by several or even more orders of magnitude. A laser is a device that emits electromagnetic radiation in the visible, ultraviolet, or infrared range, using the phenomenon of forced emission. Laser radiation is coherent, usually polarized, and has the form of a beam with very little divergence. In a laser, it is easy to obtain radiation with a very small line width, which is equivalent to very high power in a selected narrow spectral region. With pulsed lasers, it is possible to obtain a very high power in a pulse and a very short pulse duration. Both plasma devices and lasers can have different designs, properties, and applications. Plasma and laser applications include, but are not limited to, the production of new materials and the improvement in the properties of existing materials. The plasma or laser treatment of materials may lead to physicochemical changes in the structure of their surfaces. This Special Issue aims to showcase advances in plasma and laser engineering for all materials.

Best regards,
Dr. Mariusz Jasinski
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma deposition
  • laser deposition
  • plasma treatment of materials
  • laser treatment of materials
  • plasma activation of surfaces
  • laser activation of surfaces
  • pulsed plasmas
  • pulsed lasers
  • new materials
  • plasma sources
  • laser sources
  • plasma engineering
  • laser engineering

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This special issue is now open for submission.
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