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Atomic Layer Deposition for the Synthesis and Application of Thin...
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Atomic Layer Deposition for the Synthesis and Application of Thin Films

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: closed (28 February 2022) | Viewed by 7519

Special Issue Editors

Dr. Catalina Mansilla Sanchez

E-Mail Website
Guest Editor
Ctechnano Coating Technologies, Tolosa Hibiridea 76, 20018 San Sebastián, Spain
Interests: thin film deposition; material characterization; materials; materials science; nanomaterials; nanomaterials synthesis; X-ray diffraction; thin films and nanotechnology; nanostructured materials; atomic layer deposition; electron beam evaporation; residual stress; slit milling; SEM; focus ion beam; focus electron beam-induced depositon; focus ion beam-induced deposition; secondary ion mass spectrometry
Dr. Diego Martinez-Martinez

E-Mail Website
Co-Guest Editor
Centre of Physics of Universities of Minho and Porto, School of Sciences, University of Minho, Campus de Azurém, 4800–058 Guimaraes, Portugal
Interests: tribology; protection; wear; friction; mechanical properties; hardness; toughness; coatings; deposition on flexible substrates; thin films; self-lubrication; nanomaterials; nanocomposites
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Atomic layer deposition (ALD) is a technique that allows the conformal deposition of thin films with excellent quality. This issue is devoted to novel developments on ALD, such new precursors that allow the deposition of new materials and/or better purity or quality of the deposited films. Furthermore, contributions deescribing new applications of ALD are welcome, for instance, on complex substrates with reduced dimensionality such as nanoparticles (0D), nanotubes (1D), and nanolyers (2D). In addition, we are particularly interested in the use of ALD technology on porous substrates (e.g., porous fibers or polymers) leading to the so-called vapor phase infiltration (VPI) technique.

Dr. Catalina Mansilla Sanchez
Dr. Diego Martinez-Martinez
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (3 papers)

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Research

13 pages, 2231 KiB  
Article
Photocatalytic Activity in the In-Flow Degradation of NO on Porous TiO2–Coated Glasses from Hybrid Inorganic–Organic Thin Films Prepared by a Combined ALD/MLD Deposition Strategy
by Ramón Azpiroz, Marina Borraz, Aida González, Catalina Mansilla, Manuel Iglesias and Jesús J. Pérez-Torrente
Coatings 2022, 12(4), 488; https://doi.org/10.3390/coatings12040488 - 5 Apr 2022
Cited by 2 | Viewed by 2027
Abstract
A combined ALD/MLD (where ALD and MLD stand for atomic and molecular layer deposition, respectively) deposition strategy using TiCl4, H2O and HQ (hydroquinone) as precursors has been applied for the preparation of inorganic–organic thin films on soda-lime glasses. The [...] Read more.
A combined ALD/MLD (where ALD and MLD stand for atomic and molecular layer deposition, respectively) deposition strategy using TiCl4, H2O and HQ (hydroquinone) as precursors has been applied for the preparation of inorganic–organic thin films on soda-lime glasses. The alternate deposition of TiO2 layers, by pulsing TiCl4/H2O (ALD), and hybrid layers, using TiCl4/HQ (MLD), results in the formation of thin films that are precursors for porous TiO2-coatings after removal of the HQ template by annealing. The coated-glassed show good photocatalytic activity in the degradation of NO with up to 15% reduction of NO concentration in three successive photocatalytic cycles of 5 h each. Surface Scanning Electron Microscopy (SEM) images show that the TiO2-coating is composed of large grains that are made up of finer subgrains resulting in a porous structure with an average pore size of 3–4 nm. Transmission Electron Microscopy (TEM) images show two regions, a porous columnar structure on top and a denser region over the glass substrate. Energy Dispersive X-Ray (EDX) analysis, nanocrystal electron diffraction and Raman spectroscopy confirm the presence of the anatase phase, which, together with the porosity of the material, accounts for the observed photocatalytic activity. Full article
(This article belongs to the Special Issue Atomic Layer Deposition for the Synthesis and Application of Thin Films)
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15 pages, 2500 KiB  
Article
Evaluation of Transparent ITO/Nano-Ag/ITO Electrode Grown on Flexible Electrochromic Devices by Roll-to-Roll Sputtering Technology
by Yuang-Tung Cheng, Tsung-Lin Lu, Min-Han Hong, Jyh-Jier Ho, Chau-Chang Chou, Jiajer Ho and Tung-Po Hsieh
Coatings 2022, 12(4), 455; https://doi.org/10.3390/coatings12040455 - 27 Mar 2022
Cited by 4 | Viewed by 2066
Abstract
This paper explores the flexible ITO/nano-Ag/ITO multilayer electrodes grown on polyethylene terephthalate (PET) substrates and processed by a continuous roll-to-roll (R2R) sputtering system at room temperature used for flexible electrochromic device (ECD) applications. The effect of the nano-Ag interlayer thickness on the electrical [...] Read more.
This paper explores the flexible ITO/nano-Ag/ITO multilayer electrodes grown on polyethylene terephthalate (PET) substrates and processed by a continuous roll-to-roll (R2R) sputtering system at room temperature used for flexible electrochromic device (ECD) applications. The effect of the nano-Ag interlayer thickness on the electrical and optical properties of the flexible ITO/nano-Ag/ITO multilayer was thoroughly investigated. By using R2R-sputtered at an Ag DC power of 0.2 kW, we were able to achieve optimal ITO/nano-Ag/ITO multilayer that exhibits a high optical transmittance of 87.19% and the best figure of merit value (30.93 × 10−3 Ω−1). The EC performance and stability of the flexible devices were tested by a cathodic WO3 coloration. Coloring and bleaching tests show that ITO/nano-Ag/ITO multilayers are highly effective conductors, indicating that the R2R sputtering technique is a promising continuous sputtering process in preparing for the fabrication of optical devices and flexible electronics industries. Full article
(This article belongs to the Special Issue Atomic Layer Deposition for the Synthesis and Application of Thin Films)
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21 pages, 6018 KiB  
Article
Structure and Electrical Properties of Zirconium-Aluminum-Oxide Films Engineered by Atomic Layer Deposition
by Joonas Merisalu, Taivo Jõgiaas, Toomas Daniel Viskus, Aarne Kasikov, Peeter Ritslaid, Tanel Käämbre, Aivar Tarre, Jekaterina Kozlova, Hugo Mändar, Aile Tamm, Jaan Aarik and Kaupo Kukli
Coatings 2022, 12(4), 431; https://doi.org/10.3390/coatings12040431 - 23 Mar 2022
Cited by 2 | Viewed by 2564
Abstract
Thin films containing either multilayer ZrO2:Al2O3 structures or ZrO2 deposited on ZrxAlyOz buffer layers were characterized. The films were grown by atomic layer deposition (ALD) at 300 °C from ZrCl4, [...] Read more.
Thin films containing either multilayer ZrO2:Al2O3 structures or ZrO2 deposited on ZrxAlyOz buffer layers were characterized. The films were grown by atomic layer deposition (ALD) at 300 °C from ZrCl4, Al(CH3)3, and H2O. The multilayer ZrO2:Al2O3 structures were grown repeating different combinations of ZrO2 and Al2O3 ALD cycles while the ZrxAlyOz layers were obtained in a novel process using ALD cycles based on successive adsorption of ZrCl4 and Al(CH3)3, followed by surface reaction with H2O. The films were grown on TiN electrodes, and supplied with Ti top electrodes, whereby ZrxAlyOz films were exploited as thin buffer layers between TiN and ZrO2. The as-deposited ZrO2 films and ZrO2:Al2O3 structures with sufficiently low concentrations of Al2O3 were crystallized in the form of cubic or tetragonal ZrO2 polymorph possessing relative permittivities reaching 35. Notably, multilayered ZrO2:Al2O3 films could exhibit resistive switching behavior with ratios between low- and high-resistive-state current values, extending up to five orders of magnitude. Implications of multilevel switching were recorded. In the double-layered ZrxAlyOz-ZrO2 stacks, the ON/OFF current ratios remained below 40, but the endurance could become extended over 3000 cycles. Remarkably, instabilities, when detected in endurance behavior expressed by reduction in an ON/OFF current ratio could be compensated and the current values restored by real time readjustment of the programming voltage amplitude. Full article
(This article belongs to the Special Issue Atomic Layer Deposition for the Synthesis and Application of Thin Films)
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