Advanced Functional Coatings for Photocatalytic and Self-Cleaning Applications

Dear Colleagues,

The goal of this Special Issue, entitled "Advanced Functional Coatings for Photocatalytic and Self-Cleaning Applications", is to explore the most emerging research in the field of photocatalysis and self-cleaning function, and is mainly devoted to applications related to the control and remediation of environmental pollution.

Welcome are all research works that address the novelty and challenges of the improvement of synthesis and characterization methods of new photocatalyst architectures to work under solar light irradiation. For a given application, the new photocatalyst architectures should be able to increase the photodegradation of pollutants in both the gas and liquid phase and also promote the self-cleaning function of photoinduced superhydrophilic or superhydrophobic surfaces.

The potential use of photocatalysis for degradation of pollutants, both in the gas and liquid phase, is enormous, but this issue is particularly focused on applications in which the target is the water or air removal of pollutants; in particular, the use of surfaces functionalized with new photocatalysts, which act as photocatalyst-specific immobilizer supports. Among them, and of particular interest, are the textiles, glass, cements, bituminous and other surfaces that find a massive range of applications in diverse areas, such as the textile industry (for decontamination of industrial effluents), building construction (depollution of building facades, self-cleaning windows, etc.), road pavement industry in which functionalized bituminous surfaces can endorse large-scale degradation of organic compounds adsorbed to their surfaces, or promote air decontamination in large cities where many pollutants are directed released into the environment due to car emissions.

You are all invited to submit a manuscript for this Special Issue, in the form of research papers, communications, or reviews.

Prof. Joaquim Carneiro
Prof. Vasco Teixeira
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. ChemEngineering is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• synthesis
• characterization
• crystalline structure
• optical properties
• band gap
• morphology
• depollution
• wastewater treatment
• air cleaning
• semiconductor
• doping
• photocatalysis
• self-cleaning
• functional coating