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Journal: Processes, 2022
Volume: 10
Number: 2665

Article: Effect of Positive Bias and Pressure on Plasma Flow Characteristics in a Chemical Vapor Deposition Chamber
Authors: by Bisheng Wang, Di Yang, Ximing Zhu, Yang Zhao, Shuai Wang, Jiaqi Zhu and Ming Zhai
Link: https://www.mdpi.com/2227-9717/10/12/2665

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