Improving Performance and Breakdown Voltage in Normally-Off GaN Recessed Gate MIS-HEMTs Using Atomic Layer Etching and Gate Field Plate for High-Power Device Applications
Abstract
:1. Introduction
2. Devices’ Fabrication
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Ref. | VTH (V) | ID, max (mA/mm) | RON,SP (mΩ·cm2) | BV (V) |
---|---|---|---|---|
This work | 2.0 | 608 | 1.27 | 720 at 1 µA/mm 1190 at 1 mA/mm |
[54] | 0.5 | 836 | 1.48 | 705 at 1 µA/mm |
[55] | 1.35 | 500 | 1.56 | 1400 at 5 µA/mm |
[56] | 0.4 | 356 | 2.79 | 880 at 5 µA/mm |
[57] | 1.5 | 110 | 1.5 | 135 at 1 mA/mm |
[58] | 3.2 | 630 | 3.3 | 696 at 34 mA/mm |
[59] | 3.0 | 363 | 0.87 | 650 at 1 µA/mm |
[60] | 1.2 | 825 | 0.63 | 810 at 1 mA/mm |
[61] | 0.8 | 312 | 2.73 | 852 at 1 µA/mm |
[62] | 2.6 | 823 | 1.76 | 710 at 10 µA/mm |
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Liu, A.-C.; Tu, P.-T.; Chen, H.-C.; Lai, Y.-Y.; Yeh, P.-C.; Kuo, H.-C. Improving Performance and Breakdown Voltage in Normally-Off GaN Recessed Gate MIS-HEMTs Using Atomic Layer Etching and Gate Field Plate for High-Power Device Applications. Micromachines 2023, 14, 1582. https://doi.org/10.3390/mi14081582
Liu A-C, Tu P-T, Chen H-C, Lai Y-Y, Yeh P-C, Kuo H-C. Improving Performance and Breakdown Voltage in Normally-Off GaN Recessed Gate MIS-HEMTs Using Atomic Layer Etching and Gate Field Plate for High-Power Device Applications. Micromachines. 2023; 14(8):1582. https://doi.org/10.3390/mi14081582
Chicago/Turabian StyleLiu, An-Chen, Po-Tsung Tu, Hsin-Chu Chen, Yung-Yu Lai, Po-Chun Yeh, and Hao-Chung Kuo. 2023. "Improving Performance and Breakdown Voltage in Normally-Off GaN Recessed Gate MIS-HEMTs Using Atomic Layer Etching and Gate Field Plate for High-Power Device Applications" Micromachines 14, no. 8: 1582. https://doi.org/10.3390/mi14081582