Advancements in Nanofabrication: Innovations in Advanced Semiconductor Materials and Processes for Next-Generation Lithography

Dear Colleagues,

Overview:

This Special Issue aims to explore the cutting-edge advancements in nanofabrication, with a specific focus on innovations in advanced semiconductor materials and processes for next-generation lithography. The integration of novel materials and sophisticated processes plays a pivotal role in pushing the boundaries of nanofabrication techniques, impacting various technological domains.

Scope:

We invite contributions that delve into the forefront of nanofabrication technologies, emphasizing advancements in semiconductor materials and processes that directly impact next-generation lithography methods. Topics of interest include, but are not limited to, the development of novel materials, breakthroughs in lithographic techniques, process optimization, and the application of nanofabrication in emerging technologies.

Potential Themes:

Advanced Semiconductor Materials: Explore the latest developments in semiconductor materials such as advanced photoresists, high-index materials, and alternative lithographic materials.

Innovative Lithographic Techniques: Investigate novel approaches and methodologies in lithography, including extreme ultraviolet (EUV) lithography, directed self-assembly, and other emerging techniques.

Process Optimization and Integration: Address challenges and breakthroughs in optimizing nanofabrication processes, as well as strategies for the seamless integration of advanced materials into existing fabrication workflows.

Applications in Emerging Technologies: Showcase the practical applications of nanofabrication innovations in areas such as quantum computing, photonics, bioelectronics, and other cutting-edge technologies.

Submission Guidelines:

Authors are encouraged to submit original research articles, reviews, and perspectives that contribute to the understanding and advancement of nanofabrication technologies. Manuscripts should be prepared in accordance with the journal's guidelines, and submissions will undergo a rigorous peer-review process.

We look forward to receiving your contributions and collectively collating the most recent advances in nanofabrication through innovations in advanced semiconductor materials and processes.

Dr. Sihai Luo
Dr. Jingyuan Deng
Dr. Chun Cao
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• nanofabrication
• next-generation lithography
• advanced photoresists
• extreme ultraviolet lithography (EUV)
• directed self-assembly
• process optimization
• photonics
• nanotechnology applications
• nanomaterial characterization