ALD Technique for Functional Coatings of Nanostructured Materials, Volume II
A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanofabrication and Nanomanufacturing".
Deadline for manuscript submissions: closed (31 July 2023) | Viewed by 294
Special Issue Editors
Interests: magnetic nanowires and nanotubes; magneto-caloritronics; nanomagnetism
Special Issues, Collections and Topics in MDPI journals
Interests: nanoporous materials; electrochemical anodization and deposition techniques; self-assembly and self-ordered nanostructured materials; atomic layer deposition; magnetic nanowires and nanotubes; supercapacitors and energy storage devices; magneto-optical sensing and biosensing; electron microscopy and X-ray microanalysis
Special Issues, Collections and Topics in MDPI journals
Interests: thermoelectric materials and devices; thermoelectric generators for waste heat recovery applications; micro-thermoelectric coolers for thermal management of photonic integrated circuits and biosensing; nanomagnetism and magnetic characterization of self-ordered nanowires and nanotubes arrays; magnetic and electrical transport properties of single nanostructures; design of mixed fabrication processes combining electrochemistry, photolithography and atomic layer deposition techniques
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
The conformability and thickness control of thin layers achieved using the atomic layer deposition (ALD) technique have driven the development of new material structures as well as novel devices that are more efficient in many research fields (e.g., magnetism, photonics, biochemistry). The current research trends continue to focus on the development of novel materials and their growth mechanisms, as well as the design of new precursors and deposition approaches. Moreover, the implementation of such techniques in combination with existing technologies will give rise to new downsized devices with better performance. In addition, the ALD process is required in many research areas, such as the surface protection of nanostructures, allowing their manipulation and characterization to advance fundamental research and quantum phenomena investigations.
This Special Issue is focused on, but not confined to, three main research areas involving the ALD technique.
- The development of new precursors and deposition approaches to increase the state of the art of ALD materials.
- Implementation of ALD in combination with other fabrication routes to yield new nanostructured materials.
- Fabrication of advance devices using the ALD technique to improve their performance.
Dr. Victor M. de la Prida Pidal
Dr. Víctor Vega Martínez
Dr. Javier García Fernández
Guest Editors
Manuscript Submission Information
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Keywords
- atomic layer deposition
- functional coatings (biocompatible, hydrophilic or hydrophobic materials, photocatalytic, optical, photoluminescent, corrosion-resistant, etc.)
- nanomaterials
- surface layer modification
- energy storage supercapacitors
