Plasma Processing of Nanomaterials
A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanofabrication and Nanomanufacturing".
Deadline for manuscript submissions: 20 September 2024 | Viewed by 71
Special Issue Editors
Interests: plasma processing of electronic nano-materials; low temperature growth of thin epitaxial, heteroepitaxial and layers of one dimensional nano-structures
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Plasma Enhanced Deposition and/or Growth of nanomaterial films is the subject of this Special Issue. Substrates and deposited layers are solid at room temperature and can be either amorphous, polycrystalline or single-crystal, one-dimensional nanomaterials. In general, the advantage of using Plasma Enhanced Deposition techniques are their lower process temperatures, which reduce unwanted impurity diffusion and unwanted reactions between components of the substrate or deposited layers. They can also increase the deposition rate through the production of reactive species that are the precursors to film growth. Plasma can also produce reactive species such as H free radicals, which can modify the growth surface to enhance the surface mobility of adatom species. The ionic bombardment of the growth surface may also help to desorb chemical species that are impeding the adsorption and growth of the material film. These physical and chemical processes permit the deposition of new and improved electronic, optical and mechanical micro- and nanoscale devices.
This Special Issue aims to cover recent progress in the fabrication, material processing, resulting properties, and applications of micro- and nano-scale devices. Potential topics include, but are not limited to, the following:
- Various processing strategies and characterization methods of new and existing microelectronic materials;
- Transient and steady-state responses of optical, magnetic, electronic and catalytic properties;
- Various applications in optoelectronics, photovoltaics, biomedicine and quantum information processing.
Prof. Dr. Walter Varhue
Dr. Son Van Nguyen
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2900 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- plasma enhanced deposition
- plasma enhanced epitaxial growth
- plasma enhanced reactive sputter deposition
- optical and electronic properties
- microelectronic devices
