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Coatings
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Surface Functionalization by ALD Technology
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Surface Functionalization by ALD Technology

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: closed (31 May 2021) | Viewed by 19660

Special Issue Editor

Prof. Dr. Adriana Szeghalmi

E-Mail Website
Guest Editor
1. Friedrich Schiller University Jena, Albert-Einstein-Str. 13, 07745 Jena, Germany
2. Fraunhofer Institute of Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany
Interests: atomic layer deposition; optical coatings; oxides, metals, composites, nanolaminates and multilayers; interference coatings; diffractive optics

Special Issue Information

Dear Colleagues,

Atomic layer deposition (ALD) and related molecular layer deposition (MLD) are the most powerful technologies for conformal coating of micro/nano structured or complex shaped substrates. Intense research of ALD materials, their properties, and their applications in recent decades have brought this technology from the R&D laboratories to an industrial level. Continuous development of ALD materials and processes is mandatory to achieve next generation devices with improved efficiency and reduced costs. The quest for better functional thin film coatings will surely consider more and more complex material systems. Atomic layer deposition is an ideal technology for engineering novel material systems, because it allows for precise (sub-atomic) composition control for most complex composites combining different materials. Dielectrics, metals, semiconductors, and organic material can now be mixed in an ultra-thin film.

This Special Issue of Coatings is devoted to surface functionalization by ALD and will consider original research as well as review articles.

The topics of interest include, but are not limited to:

  • Material sciences such as the development of novel materials and processes; improving the properties of ALD thin films; single/doped or multilayer systems; and growth characteristics such as uniformity, reproducibility, growth rate, scale-up, etc.
  • Chemical and physical properties of surface functional coatings and studies on the relationship between film composition and properties;
  • Applications of functional thin films for electronics, energy saving, barriers and encapsulation, antibacterial, photocatalytic, optical, decorative, or other emerging fields.

Dr. Adriana Szeghalmi
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (3 papers)

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Research

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13 pages, 1930 KiB  
Article
Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
by Pallabi Paul, Kristin Pfeiffer and Adriana Szeghalmi
Coatings 2020, 10(1), 64; https://doi.org/10.3390/coatings10010064 - 10 Jan 2020
Cited by 24 | Viewed by 7118
Abstract
Antireflection coatings (ARC) are essential for various optical components including such made of plastics for high volume applications. However, precision coatings on plastics are rather challenging due to typically low adhesion of the coating to the substrate. In this work, optimization of the [...] Read more.
Antireflection coatings (ARC) are essential for various optical components including such made of plastics for high volume applications. However, precision coatings on plastics are rather challenging due to typically low adhesion of the coating to the substrate. In this work, optimization of the atomic layer deposition (ALD) processes towards conformal optical thin films of Al2O3, TiO2 and SiO2 on poly(methyl methacrylate) (PMMA) has been carried out and a five-layer ARC is demonstrated. While the uncoated PMMA substrates have a reflectance of nearly 8% in the visible (VIS) spectral range, this is reduced below 1.2% for the spectral range of 420–670 nm by applying a double-side ARC. The total average reflectance is 0.7%. The optimized ALD coatings show a good adhesion to the PMMA substrates even after the climate test. Microscopic analysis on the cross-hatch areas on PMMA after the climate test indicates very good environmental stability of the ALD coatings. These results enable a possible route by ALD to deposit uniform, crack free, adhesive and environmentally durable thin film layers on sensitive thermoplastics like PMMA. Full article
(This article belongs to the Special Issue Surface Functionalization by ALD Technology)
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16 pages, 5399 KiB  
Article
Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
by Yury Koshtyal, Denis Nazarov, Ilya Ezhov, Ilya Mitrofanov, Artem Kim, Aleksander Rymyantsev, Oleksiy Lyutakov, Anatoly Popovich and Maxim Maximov
Coatings 2019, 9(5), 301; https://doi.org/10.3390/coatings9050301 - 3 May 2019
Cited by 62 | Viewed by 8435
Abstract
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a [...] Read more.
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp2 was 200–300 °C, but the optimal Ni(MeCp)2 growth per ALD cycle was 0.011–0.012 nm for both precursors at 250–300 °C. The films deposited using NiCp2 and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm3) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28–30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge–discharge curves (U(C)). Full article
(This article belongs to the Special Issue Surface Functionalization by ALD Technology)
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Review

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17 pages, 3165 KiB  
Review
Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids
by Guang-Jie Yuan, Jie-Fei Xie, Hao-Hao Li, Hong-Liang Lu and Ying-Zhong Tian
Coatings 2019, 9(12), 806; https://doi.org/10.3390/coatings9120806 - 1 Dec 2019
Cited by 4 | Viewed by 3336
Abstract
Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has [...] Read more.
Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed. Full article
(This article belongs to the Special Issue Surface Functionalization by ALD Technology)
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