Magnetron Sputtering Deposition: Challenges, Developments, Perspectives
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".
Deadline for manuscript submissions: closed (30 November 2020) | Viewed by 14382
Special Issue Editors
Interests: thin film deposition; magnetron sputtering; dusty plasmas; plasma diagnostics
Special Issue Information
Dear Colleagues,
Magneton sputtering is a versatile tool for the deposition of thin solid films and functional coatings. In addition, magnetron sputtering is employed in the fabrication of nano-structured thin films and the deposition of nano-sized clusters on solid surfaces. Such functional coatings are of interest from both the basic and applied points of view. Magnetron sputtering is a discharge phenomenon which produces a large variety of reactive species such as electrons, ions, energetic atoms and radicals. The species interact in the forming plasma and on the substrate surface where the coating forms. It is common to low temperature plasmas that are in a non-equilibrium state that many of the interactions are not known in every detail and that the properties of the deposited coatings are a priori difficult to predict without further assumptions.
Reactive magnetron sputtering and co-sputtering is employed during the deposition of composite and alloy (binary, ternary, etc.) materials and, in particular, of oxide and nitride films with unique properties, e.g., electrical, optical, tribological, catalytic properties. The scope of this forthcoming Special Issue is dedicated, but not limited, to the deposition of functional coatings by means of magnetron sputtering and the characterization of the films with regard to their physical, chemical, and functional properties.
In particular, the topic of interest includes but is not limited to:
- the deposition of functional coatings with unique properties,
- fabrication of nanostructured surfaces and 3D structures,
- fabrication of novel electronics and spintronics devices,
- deposition of semiconductor thin film structures for optical and photonic applications
- advanced plasma diagnostics in relation to film properties,
- the advancement of thin film deposition processes,
- simulation and modelling of thin film growth in a reactive sputtering plasma environment, and
- new material research.
Prof. Dr. Rainer Hippler
Dr. Zdeněk Hubička
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
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