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Coatings
Special Issues
Atomic Layer Deposition: Recent Developments and Future Challenges
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Atomic Layer Deposition: Recent Developments and Future Challenges

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: closed (20 September 2021) | Viewed by 6037

Special Issue Editors

Prof. Dr. Zinetula Insepov

E-Mail Website
Guest Editor
School of Nuclear Engineering, Purdue University, 500 Central Drive, West Lafayette, IN 47907, USA
Interests: ultrathin film; ion beam materials processing; nuclear materials; high-gradient accelerators; interaction of plasma with surfaces
Special Issues, Collections and Topics in MDPI journals
Dr. Maxim Yu. Maximov

E-Mail Website
Guest Editor
Department of Material Science and Technology, Peter the Great St. Petersburg Polytechnic University, Polytechnicheskayast. 29, Saint-Petersburg 195251, Russia
Interests: atomic layer deposition; coatings and thin films; lithium-ion batteries; thin-film and solid-state batteries; materials science, synthesis and characterization; electrochemistry
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

The aim of this Special Issue is to publish as well as original research papers reviews from leading groups around the world, both experimental and theoretical, with achievements in the new field of ultrathin coatings.

More specifically, this Special Issue of Coatings on ultra-thin atomic layer deposition aims to: (i) Collect in one place fundamental research findings on ALD obtained at different groups, sometimes in exotic fields; to give an example, ALD was applied recently to RF cavities of high-gradient accelerators to resolve a nearly 100-year-old vacuum breakdown problem; (ii) facilitate dissemination of the science and technology of ALD among universities, teachers and students; (iii) transfer the results of fundamental and applied work conducted in many leading laboratories recently to industry.

Traditional CVD and PVD processes are also planned to be covered for comparison.

The Special Issue plans to cover coatings, surfaces, and interfaces in the broader sense.

  • Ultrathin films—Atomic Layer Deposition;
  • Surfaces passivated by carbon atoms;
  • Coatings using CNT, fullerenes, graphene, GO, MoS2, BN;
  • Characterization techniques (SPM; SEM, TEM; XPS; AFM, STM);
  • Applied surface science;
  • Adsorption, adhesion, functionalization;
  • Fundamental and functional properties of surface and interfaces;
  • Theoretical and computational modeling of surfaces and interfaces;
  • Super-hydrophobicity;
  • Super-hydrophilicity;
  • Anti-icing coatings;
  • Self-healing coating;
  • Anti-corona coatings.

Prof. Dr. Zinetula Insepov
Dr. Maxim Yu. Maximov
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (2 papers)

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Research

20 pages, 6171 KiB  
Article
Influence of α-Al2O3 Template and Process Parameters on Atomic Layer Deposition and Properties of Thin Films Containing High-Density TiO2 Phases
by Kristel Möls, Lauri Aarik, Hugo Mändar, Aarne Kasikov, Taivo Jõgiaas, Aivar Tarre and Jaan Aarik
Coatings 2021, 11(11), 1280; https://doi.org/10.3390/coatings11111280 - 21 Oct 2021
Cited by 1 | Viewed by 1899
Abstract
High-density phases of TiO2, such as rutile and high-pressure TiO2-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO2-II with anatase and rutile have been considered promising materials for [...] Read more.
High-density phases of TiO2, such as rutile and high-pressure TiO2-II, have attracted interest as materials with high dielectric constant and refractive index values, while combinations of TiO2-II with anatase and rutile have been considered promising materials for catalytic applications. In this work, the atomic layer deposition of TiO2 on α-Al2O3 (0 0 0 1) (c-sapphire) was used to grow thin films containing different combinations of TiO2-II, anatase, and rutile, and to investigate the properties of the films. The results obtained demonstrate that in a temperature range of 300–400 °C, where transition from anatase to TiO2-II and rutile growth occurs in the films deposited on c-sapphire, the phase composition and other properties of a film depend significantly on the film thickness and ALD process time parameters. The changes in the phase composition, related to formation of the TiO2-II phase, caused an increase in the density and refractive index, minor narrowing of the optical bandgap, and an increase in the hardness of the films deposited on c-sapphire at TG ≥ 400 °C. These properties, together with high catalytic efficiency of mixed TiO2-II and anatase phases, as reported earlier, make the films promising for application in various functional coatings. Full article
(This article belongs to the Special Issue Atomic Layer Deposition: Recent Developments and Future Challenges)
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15 pages, 2982 KiB  
Article
Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide
by Pavel Fedorov, Denis Nazarov, Oleg Medvedev, Yury Koshtyal, Aleksander Rumyantsev, Vladimir Tolmachev, Anatoly Popovich and Maxim Yu Maximov
Coatings 2021, 11(10), 1206; https://doi.org/10.3390/coatings11101206 - 01 Oct 2021
Cited by 1 | Viewed by 3287
Abstract
The tantalum oxide thin films are promising materials for various applications: as coatings in optical devices, as dielectric layers for micro and nanoelectronics, and for thin-films solid-state lithium-ion batteries (SSLIBs). This article is dedicated to the Ta-O thin-film system synthesis by the atomic [...] Read more.
The tantalum oxide thin films are promising materials for various applications: as coatings in optical devices, as dielectric layers for micro and nanoelectronics, and for thin-films solid-state lithium-ion batteries (SSLIBs). This article is dedicated to the Ta-O thin-film system synthesis by the atomic layer deposition (ALD) which allows to deposit high quality films and coatings with excellent uniformity and conformality. Tantalum (V) ethoxide (Ta(OEt)5) and remote oxygen plasma were used as tantalum-containing reagent and oxidizing co-reagent, respectively. The influence of deposition parameters (reactor and evaporator temperature, pulse and purge times) on the growth rate were studied. The thickness of the films were measured by spectroscopic ellipsometry, scanning electron microscopy and X-ray reflectometry. The temperature range of the ALD window was 250–300 °C, the growth per cycle was about 0.05 nm/cycle. Different morphology of films deposited on silicon and stainless steel was found. According to the X-ray diffraction data, the as-prepared films were amorphous. But the heat treatment study shows crystallization at 800 °C with the formation of the polycrystalline Ta2O5 phase with a rhombic structural type (Pmm2). The results of the X-ray reflectometry show the Ta-O films’ density is 7.98 g/cm3, which is close to the density of crystalline Ta2O5 of the rhombic structure (8.18 g/cm3). The obtained thin films have a low roughness and high uniformity. The chemical composition of the surface and bulk of Ta-O coatings was studied by X-ray photoelectron spectroscopy and energy-dispersive X-ray spectroscopy. Surface of the films contain Ta2O5 and some carbon contamination, but the bulk of the films does not contain carbon and any precursor residues. Cyclic voltammetry (CVA) showed that there is no current increase for tantalum (V) oxide in a potential window of 3–4.2 V and has prospects of use as protective coatings for cathode materials of SSLIBs. Full article
(This article belongs to the Special Issue Atomic Layer Deposition: Recent Developments and Future Challenges)
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