Multilayer and Functional Graded Coatings—2nd Edition

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 31 May 2024 | Viewed by 814

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Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, Keelung, Taiwan
Interests: bond coats; diffusion barriers; glass molding technology; high-entropy alloy films; internal oxidation; metallic coatings; nanocomposite nitride films; thin-film metallic glasses; transition metal nitride films
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Special Issue Information

Dear Colleagues,

Multilayer coatings consist of sublayers with alternative variations in their chemical concentrations or crystalline structures. The multilayer structure is beneficial for improving their oxidation resistance, enhancing their mechanical properties, reducing internal stress, inhibiting crack propagation, and improving fracture toughness. For example, a columnar crystalline structure formed in a monolithic coating is not possible due to the distinct characteristics between the sublayers. With the introduced interfaces, multilayer hard coatings have displayed hardness enhancements due to dislocation blocking between the interfaces, lattice mismatch, and Hall–Petch effects. Multilayer coatings comprise various assemblies, such as metal/metal, metal/nitride, nitride/nitride, and oxide/metal ones. This Special Issue on "Multilayer and Functional Graded Coatings—2nd Edition" is open to all original research and critical review articles.

Prof. Dr. Yung-I Chen
Guest Editor

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Keywords

  • corrosion protection
  • diffusion barriers
  • gradient concentration
  • laminated coatings
  • mechanical properties
  • multilayer coating
  • optical coating
  • oxidation resistance
  • protective coatings

Published Papers (1 paper)

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Research

18 pages, 12129 KiB  
Article
Characterization of ZrBSiTaNx Films
by Kuo-Hong Yeh, Li-Chun Chang and Yung-I Chen
Coatings 2024, 14(4), 487; https://doi.org/10.3390/coatings14040487 - 15 Apr 2024
Viewed by 425
Abstract
In this study, ZrBSiTa and (ZrBSiTa)Nx films were deposited on silicon wafers through direct current magnetron cosputtering. The nitrogen flow ratio (RN2) of the reactive gas and the sputter power applied to the Si target (PSi) were the [...] Read more.
In this study, ZrBSiTa and (ZrBSiTa)Nx films were deposited on silicon wafers through direct current magnetron cosputtering. The nitrogen flow ratio (RN2) of the reactive gas and the sputter power applied to the Si target (PSi) were the variables in the fabricating processes. The influence of the N and Si contents on the mechanical properties, thermal stability, and oxidation behavior of the ZrBSiTa and (ZrBSiTa)Nx films were investigated. All the as-fabricated films exhibited amorphous structures. The RN2 set at 0.1, 0.2, and 0.4 caused the ZrBSiTaNx films to exhibit high N contents of 52–55, 62–64, and 63–64 at.%, respectively. The Si content of the ZrBSiTa films increased from 0 to 42 at.% as PSi increased from 0 to 150 W, and this was accompanied by decreases in hardness and Young’s modulus values from 19.1 to 14.3 GPa and 264 to 242 GPa, respectively. In contrast, the increase in Si content of the (ZrBSiTa)Nx films from 0 to 21 at.% increased the hardness from 11.5 to 14.0 GPa, and Young’s modulus from 207 to 218 GPa. Amorphous BN and SiNx phases in the (ZrBSiTa)Nx films varied the structural and mechanical properties. The thermal stability of the (ZrBSiTa)Nx films was evaluated by annealing at 800–900 °C for 10–30 min in Ar. The oxidation behavior of the (ZrBSiTa)Nx films was evaluated in the ambient air at 800 °C for 0.5–24 h. The amorphous (ZrBSiTa)Nx films with a high Si content had high thermal stability and oxidation resistance. Full article
(This article belongs to the Special Issue Multilayer and Functional Graded Coatings—2nd Edition)
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