Advanced Oxidation Technologies for the Removal of Refractory Organic Contaminants in Water and Wastewater

A special issue of Water (ISSN 2073-4441). This special issue belongs to the section "Wastewater Treatment and Reuse".

Deadline for manuscript submissions: closed (24 April 2024) | Viewed by 185

Special Issue Editors


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Guest Editor
State Key Laboratory of Environmental Aquatic Chemistry, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing, China
Interests: UV disinfection; advanced oxidation; nanofiltration; computational fluid dynamics; water treatment; wastewater purification

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Guest Editor
Jiangxi Provincial Key Laboratory of Water Ecological Conservation at Headwater Regions, Jiangxi University of Science and Technology, 1958 Ke-jia Road, Ganzhou 341000, China
Interests: UV-based advanced oxidation; disinfection by-products; microplastics; water treatment; wastewater purification

Special Issue Information

Dear Colleagues,

Refractory organic contaminants, arising from daily life, agricultural activity, and industrial production, have become a global concern due to their persistence in water and toxicity to most living creatures. The efficient removal of these contaminants is thus highly demanded. Advanced oxidation technologies that generate reactive radicals comprise a promising barrier that can block contaminants from entering natural waters and the drinking water system. Nonetheless, these technologies are usually energy-intensive compared to traditional water treatment processes. Innovations and progress are being made continuously to improve the contaminant removal efficiency. This Special Issue is devoted to covering the recent advances in this respect. The new results and findings facilitate the sustainable control of the refractory organic contaminants in water and wastewater.

We will publish studies focused on either classical or novel advanced oxidation technologies (e.g., UV/H2O2, O3-MNBs), and the target contaminant will trace organic contaminants in water sources or recalcitrant organics from industrial wastewater. Both original research and review articles are welcome.

Dr. Wentao Li
Dr. Junfeng Lian
Guest Editors

Manuscript Submission Information

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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • UV-based advanced oxidation process
  • ozone-based advanced oxidation process
  • Fenton/Fenton-like process
  • trace organic contaminants
  • recalcitrant organics
  • kinetics and mechanism
  • toxicity evaluation
  • energy cost
  • reactor performance

Published Papers

There is no accepted submissions to this special issue at this moment.
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