Halogen Bonding Motifs for Anion Recognition
A special issue of Molecules (ISSN 1420-3049). This special issue belongs to the section "Physical Chemistry".
Deadline for manuscript submissions: closed (31 July 2021) | Viewed by 503
Special Issue Editors
Interests: halogen bond; chalcogen bond; anion recognition; supramolecular polymers; interlocked structures
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
The halogen bond has been demonstrated to be an exciting alternative to traditional noncovalent interactions. The term halogen bonding (XB) is used in analogy with the well-known hydrogen bonding (HB) and is the noncovalent bonding interaction between halogen atoms that function as electrophilic centers (Lewis acids) and neutral or anionic Lewis bases. The origin of the attraction is attributed to a positive region on the halogen that corresponds to the electronically-depleted outer lobe of the R–X bond. The resulting positive electrostatic potential lies on the surface of the halogen, located at the terminus of the R–X axis, while a band of negative charges remains around the equator of the halogen atom. The intermolecular force known as halogen bonding arises from the interaction of the positively charged sigma-hole with electron donating species, resulting in a strongly linear geometry which maximizes the interface of opposite charges.
In recent years, the halogen bond research field has grown enormously thanks to the effort of many researchers from theoretical and experimental points of view.
This Special Issue aims to highlight the latest advances in this research field, including catalysis, crystal engineering, molecular recognition, materials science, as well as theoretical aspects.
Dr. Antonio Caballero
Dr. Fabiola Zapata
Guest Editors
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Keywords
- molecular recognition
- theoretical calculations
- catalysis
- crystal engineering
- materials science
- supramolecular polymers
- noncovalent interactions
