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Editorial

Acknowledgement to Reviewers of ChemEngineering in 2019

by
ChemEngineering Editorial Office
MDPI, St. Alban-Anlage 66, 4052 Basel, Switzerland
ChemEngineering 2020, 4(1), 7; https://doi.org/10.3390/chemengineering4010007
Submission received: 20 January 2020 / Accepted: 20 January 2020 / Published: 21 January 2020
The editorial team greatly appreciates the reviewers who have dedicated their considerable time and expertise to the journal’s rigorous editorial process over the past 12 months, regardless of whether the papers are finally published or not. In 2019, a total of 90 papers were published in the journal, with a median time to first decision of 23 days and a median time from submission to publication of 67 days. The editors would like to express their sincere gratitude to the following reviewers for their generous contribution in 2019:
Ashekuzzaman, S.M.Meng, Xinghua
Atta-Obeng, EmmanuelMierzwa, Dominik
Bagnoud, AlexandreMilanesio, Marco
Baker, TomMiras, Haralampos N.
Banerjee, AbhinandanMIRONESCU, Monica
Beisl, StefanMitkowski, Piotr
Benito, PatriciaModigell, Michael
Beschkov, VenkoMonfort, Olivier
Beuermann, SabineMukherjee, Rajib
Biard, Pierre-FrançoisMurcia-Lopez, Sebastián
Bouquillon, SandrineMuromachi, Sanehiro
Boy, VirginieMutin, P. Hubert
Buranaj Hoxha, BesmirNa, Kyungsu
Cabrales, LuisNanjundaswamy, Ananda
Calabro, Paolo S.Nardi, Monica
Cantero, DomingoNhuchhen, Daya
Carreon, MoisesNobile, Lucio
Chai, LeiNocchetti, Morena
Chakraborty, UdayOancea, Florin
Chen, Shih-HsunOguntimein, Gbekeloluwa B.
Chen, ZhichaoOliveira Santos, Lino De
Cirujano, FranciscoOsman, Ahmed
Constantinou, IordaniaOstanek, Jason
Conterosito, EleonoraPandit, Arka
Corral Bobadilla, MarinaPanek, Rafal
Crocker, MarkPanetta, Riccardo
Culebras, MarioPasman, Hans J.
Da Silva, MarceloPaszkiewicz, Monika
De Blasio, CataldoPauliukaite, Rasa
Della Ca, NicolaPenkova, Nina
Devasurendra, AmilaPezzuolo, Andrea
Distler, PetrPinto, Gustavo Filipe
Dixon, Anthony G.Pohl, Pawel
Drenkova-Tuhtan, AsyaPoulios, Ioannis
Drobna, HelenaPuig, Jean
Dudynski, MarekPurcar, Violeta
Dumbrava, AncaRaccichini, Rinaldo
Dutta, KingshukRamadoss, Ananthakumar
Dutta, GaurabRamakrishnan, Sayanthan
Dzida, MarzenaRamirez, Jerome
Dziurkowska, EwelinaRegmi, Bishnu
Dzyuba, SergeiReynier, Nicolas
Ecorchard, PetraRizvi, Syed A. A.
Fasano, AndreaRizzolo, Anna
Favergeon, LoïcRodziewicz, Joanna
Feczko, TivadarRomdhana, Hedi
Fegade, SwapnilRosas, Ramiro Ruiz
Finney, AaronRybarczyk, Piotr
Fresner, JohannesSaakes, Michel
Fujita, ToyohisaSafaei, M. R.
Furukawa, KenjiSalmas, Constantinos E .
Galenda, AlessandroSarma, Saurav
Galkin, MaximSato, Takaya
Gan, YongSchaffoener, Stefan
Gardy, JabbarSeiner, Brienne N.
Gazizulina, AlbinaSenadeera, Wijitha
Geise, Geoffrey M.Sengupta, Saptarshi
Ghannad-Rezaie, MostafaShi, Suan
Ghavami, MohammadShibata, Ikuya
Giovannetti, RitaShinde, Surendra K.
Godlewska-Zylkiewicz, BeataShorstkii, Ivan
Gonzalez-Ayala, JulianSirkar, Kamalesh
Gorbenkova, ElenaSo, Hongyun
Guan, WenjianSogaard, Erik
Gunawan, AndreySoleimani, Majid
Hamdani, AriSon, Moon
Hashemi, ShervinSorcar, Saurav
Hillestad, MagneSorrentino, Giancarlo
Hodge, VernonSouza Filho, Pedro F.
Holmberg, HenrikSpiridigliozzi, Luca
Hong, MinSrinivasan, Sesha
Hou, Shuhn-ShyurngStaszak, Maciej
Ierapetritou, MarianthiStrehmel, Veronika
Imre, Attila R.Strube, Jochen
Inagaki, SatoshiSu, Yingchao
Isaacs, MarkSukin, Ivan
Islam, Md. NahidulSzostak, Marek
Jacob, PaulSzymanska-Pulikowska, Agata
Jaworski, ZdzisławTade, Moses
Jiang, LinTakagaki, Atsushi
Jiang, LongTanner, Eden
Jimenez, MelanieTian, Yuan
Jin, JingTolj, Ivan
Jupke, AndreasTolkou, Athanasia
Kaczor, GrzegorzTraffano-Schiffo, María Victoria
Kageshima, YosukeTrofimova, Maya
Kaluza, LuděkTrovarelli, Alessandro
Kavan, LadislavTseng, I-Hsiang
Khan, Md. ShakhaoathTsvetkov, Nikolai
KHURANA, ManinderUbertini, Stefano
Kikhtyanin, OlegUddin, Jamal
Killian, ManuelaUlaganathan, Vamseekrishna
Kim, DaehwanVakros, John
Konopka, StanisławValenzuela, Loreto
Kostoglou, NikolaosVan Driessche, Alexander
Kowalski, GregoryVanyorek, László
Kujawski, WojciechVasilevich, A. V.
Lamacz, AgataVigano, Federico
Le, ZaiyuanVinokurov, Vladimir
Lee, Yoon HoWachowski, Sebastian
Lee, Pyung SooWang, Yan
Lee, Wen-JenWang, Bo
Lee, SunwooWang, Zhenyu
Leger, LilianeWarwick, Michael E. A.
Lewandowska, KatarzynaWen, Chuang
Lgaz, HassaneWinjobi, Olumide
Li, XuejinWlodarczyk-makuła, Maria
Liang, PeishihWoodfield, Peter
Lima, Sofia CostaWright, Natasha C.
Lin, SidneyWu, Sheng-Chi
Lin, Li-ChiangWulf, Christina
Lin, Yuan-Chung (Oliver)Xie, Weiguo
Lin, JunrenXu, Shu
Lopez De Leon, Luis R.Yadavali, Sagar
Lopez-Linares, FranciscoYang, Chung-Wei
Lopez-Lopez, José A.Zaharia, Carmen
Lorentzou, SouzanaZamojc, Krzysztof
Lukinac Cacic, JasminaZhang, Jingchao
Luna, DiegoZhang, Xu
Luo, XiaoboZhang, Yanlin
Ma, TianshouZhang, Xin
Machado, Ci ntiaZhao, Ying
Mateus, Dina M. R.Zhitova, Elena
Matsumoto, MichiakiZolfaghari, Mehdi
Matula, Grzegorz

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MDPI and ACS Style

ChemEngineering Editorial Office. Acknowledgement to Reviewers of ChemEngineering in 2019. ChemEngineering 2020, 4, 7. https://doi.org/10.3390/chemengineering4010007

AMA Style

ChemEngineering Editorial Office. Acknowledgement to Reviewers of ChemEngineering in 2019. ChemEngineering. 2020; 4(1):7. https://doi.org/10.3390/chemengineering4010007

Chicago/Turabian Style

ChemEngineering Editorial Office. 2020. "Acknowledgement to Reviewers of ChemEngineering in 2019" ChemEngineering 4, no. 1: 7. https://doi.org/10.3390/chemengineering4010007

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