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Journal: Micromachines, 2019
Volume: 10
Number: 192

Article: Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting
Authors: by Prithviraj Mukherjee, Federico Nebuloni, Hua Gao, Jian Zhou and Ian Papautsky
Link: https://www.mdpi.com/2072-666X/10/3/192

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