Journal Menu► ▼ Journal Menu
Journal Browser► ▼ Journal Browser
Special Issue "Self-Assembled Block Copolymer Thin Films and Their Applications"
A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Physics and Theory".
Deadline for manuscript submissions: closed (25 April 2023) | Viewed by 9193
Special Issue Editors
Interests: block copolymers; self-assembly; nanolithography; nanoparticles; soft matter–solid interfaces
Interests: nanostructure physics; nanolithography; nanoheteroepitaxy; self-assembly; transmission electron microscopy; materials analysis
Special Issue Information
Using self-assembled block copolymer (BCP) thin films for surface nanopatterning is a promising approach for next-generation nanolithography. Thus, the creation of precise nanostructures from self-organized polymer nanodomains is investigated by academic research groups as well as R&D units of global players in semiconductor and data storage industries. Recently, significant advances have been made in controlling the polymer self-assembly into nanodomains of a particular shape at pre-defined positions and with a long-range order. Such guiding and controlling of the BCP self-assembly process renders this bottom–up technique competitive to conventional top–down lithography techniques, while allowing for a faster processing of large areas at lower costs.
Currently, feature size minimization, nanodomain definition, as well as pattern transfer to inorganic materials are studied intensely to enable full compatibility to semiconductor processing at industrial scale and to pave the way toward innovative novel fields of BCP application.
In this Special Issue, we compile and present recent findings in advancing block copolymer self-assembly to a highest-precision nanolithography technique. The aim is to shine a light on the rapidly developing field of BCP-based lithography. State-of-the-art reviews as well as articles on original novel fundamental and applied research on aspects including, but not limited to, the topics below are welcome in this Special Issue.
Dr. Katharina Brassat
Prof. Dr. Jörg K. N. Lindner
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Polymers is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- Block copolymer self-assembly
- High-X block copolymers
- Sub-10 nm lithography
- Directed self-assembly of block copolymers
- BCP thin film dewetting
- BCP pattern transfer to substrates
- BCP/Homopolymer blends
- Simulation of block copolymer self-assembly
- (Analytical) electron microscopy of polymer nanodomains
- Sequential infiltration synthesis
- Applications of BCP nanostructures
- Metrology for large-area BCP patterned films and surfaces