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Special Issue "Self-Assembled Block Copolymer Thin Films and Their Applications"

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A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Physics and Theory".

Deadline for manuscript submissions: closed (25 April 2023) | Viewed by 9193

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Special Issue Editors

Dr. Katharina Brassat

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Guest Editor

Department of Physics, Paderborn University, Warburgerstr. 100, 33098 Paderborn, Germany
Interests: block copolymers; self-assembly; nanolithography; nanoparticles; soft matter–solid interfaces

Prof. Dr. Jörg K. N. Lindner

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Guest Editor

Department of Physics, Paderborn University, Warburgerstr. 100, 33098 Paderborn, Germany
Interests: nanostructure physics; nanolithography; nanoheteroepitaxy; self-assembly; transmission electron microscopy; materials analysis

Special Issue Information

Dear colleagues,

Using self-assembled block copolymer (BCP) thin films for surface nanopatterning is a promising approach for next-generation nanolithography. Thus, the creation of precise nanostructures from self-organized polymer nanodomains is investigated by academic research groups as well as R&D units of global players in semiconductor and data storage industries. Recently, significant advances have been made in controlling the polymer self-assembly into nanodomains of a particular shape at pre-defined positions and with a long-range order. Such guiding and controlling of the BCP self-assembly process renders this bottom–up technique competitive to conventional top–down lithography techniques, while allowing for a faster processing of large areas at lower costs.

Currently, feature size minimization, nanodomain definition, as well as pattern transfer to inorganic materials are studied intensely to enable full compatibility to semiconductor processing at industrial scale and to pave the way toward innovative novel fields of BCP application.

In this Special Issue, we compile and present recent findings in advancing block copolymer self-assembly to a highest-precision nanolithography technique. The aim is to shine a light on the rapidly developing field of BCP-based lithography. State-of-the-art reviews as well as articles on original novel fundamental and applied research on aspects including, but not limited to, the topics below are welcome in this Special Issue.

Dr. Katharina Brassat
Prof. Dr. Jörg K. N. Lindner
Guest Editors

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Keywords

Block copolymer self-assembly
High-X block copolymers
Sub-10 nm lithography
Directed self-assembly of block copolymers
BCP thin film dewetting
BCP pattern transfer to substrates
BCP/Homopolymer blends
Simulation of block copolymer self-assembly
(Analytical) electron microscopy of polymer nanodomains
Sequential infiltration synthesis
Applications of BCP nanostructures
Metrology for large-area BCP patterned films and surfaces

Published Papers (4 papers)

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Research

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Open AccessArticle

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

Elisheva Michman

Meirav Oded

and

Roy Shenhar

Polymers 2022, 14(12), 2377; https://doi.org/10.3390/polym14122377 - 12 Jun 2022

Cited by 1 | Viewed by 3731

Abstract

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features. Full article

(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)

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Open AccessArticle

Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer

and

Polymers 2022, 14(4), 654; https://doi.org/10.3390/polym14040654 - 10 Feb 2022

Cited by 1 | Viewed by 1411

Abstract

Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 nm feature pattern transfer. By optimizing the amount of infiltrated material, the etch selectivity should be further improved. Here, an investigation of semi-static sequential infiltration synthesis of trimethyl aluminum (TMA) and water into maltoheptaose (MH) films, and into hydroxyl-terminated poly(styrene) (PS-OH) films, was performed, by varying the process parameters temperature, precursor pulse duration, and precursor exposure length. It was found that, by decreasing the exposure time from 100 to 20 s, the volumetric percentage on included pure Al₂O₃ in MH could be increased from 2 to 40 vol% at the expense of a decreased infiltration depth. Furthermore, the degree of infiltration was minimally affected by temperature between 64 and 100 °C. Shorter precursor pulse durations of 10 ms TMA and 5 ms water, as well as longer precursor pulses of 75 ms TMA and 45 ms water, were both shown to promote a higher degree, 40 vol%, of infiltrated alumina in MH. As proof of concept, 12 nm pitch pattern transfer into silicon was demonstrated using the method and can be concluded to be one of few studies showing pattern transfer at such small pitch. These results are expected to be of use for further understanding of the mechanisms involved in sequential infiltration synthesis of TMA/water into MH, and for further optimization of carbohydrate-based etch masks for sub-10 nm pattern transfer. Enabling techniques for high aspect ratio pattern transfer at the single nanometer scale could be of high interest, e.g., in the high-end transistor industry. Full article

(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)

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Open AccessReview

Liquid Phase Infiltration of Block Copolymers

Irdi Murataj

Eleonora Cara

Nicoletta Baglieri

Candido Fabrizio Pirri

Natascia De Leo

and

Federico Ferrarese Lupi

Polymers 2022, 14(20), 4317; https://doi.org/10.3390/polym14204317 - 14 Oct 2022

Cited by 1 | Viewed by 1005

Abstract

Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material properties to its functionalities. Self-assembling materials such as block copolymers (BCPs), in combination with liquid phase infiltration (LPI) processes, represent an ideal strategy for the synthesis of inorganic materials into even more complex and functional features. This review provides an overview of the mechanism involved in the LPI, outlining the role of the different polymer infiltration parameters on the resulting material properties. We report newly developed methodologies that extend the LPI to the realisation of multicomponent and 3D inorganic nanostructures. Finally, the recently reported implementation of LPI into different applications such as photonics, plasmonics and electronics are highlighted. Full article

(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)

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Open AccessReview

Polymer Vesicles for Antimicrobial Applications

Hui Sun

Yin Wang

and

Jiahui Song

Polymers 2021, 13(17), 2903; https://doi.org/10.3390/polym13172903 - 28 Aug 2021

Cited by 7 | Viewed by 1976

Abstract

Polymer vesicles, hollow nanostructures with hydrophilic cavity and hydrophobic membrane, have shown significant potentials in biomedical applications including drug delivery, gene therapy, cancer theranostics, and so forth, due to their unique cell membrane-like structure. Incorporation with antibacterial active components like antimicrobial peptides, etc., polymer vesicles exhibited enhanced antimicrobial activity, extended circulation time, and reduced cell toxicity. Furthermore, antibacterial, and anticancer can be achieved simultaneously, opening a new avenue of the antimicrobial applications of polymer vesicles. This review seeks to highlight the state-of-the-art of antimicrobial polymer vesicles, including the design strategies and potential applications in the field of antibacterial. The structural features of polymer vesicles, preparation methods, and the combination principles with antimicrobial active components, as well as the advantages of antimicrobial polymer vesicles, will be discussed. Then, the diverse applications of antimicrobial polymer vesicles such as wide spectrum antibacterial, anti-biofilm, wound healing, and tissue engineering associated with their structure features are presented. Finally, future perspectives of polymer vesicles in the field of antibacterial is also proposed. Full article

(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)

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Special Issue "Self-Assembled Block Copolymer Thin Films and Their Applications"

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