Self-Assembled Block Copolymer Thin Films and Their Applications

A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Physics and Theory".

Deadline for manuscript submissions: closed (25 April 2023) | Viewed by 11519

Special Issue Editors

Department of Physics, Paderborn University, Warburgerstr. 100, 33098 Paderborn, Germany
Interests: block copolymers; self-assembly; nanolithography; nanoparticles; soft matter–solid interfaces
Department of Physics, Paderborn University, Warburgerstr. 100, 33098 Paderborn, Germany
Interests: nanostructure physics; nanolithography; nanoheteroepitaxy; self-assembly; transmission electron microscopy; materials analysis

Special Issue Information

Dear colleagues,

Using self-assembled block copolymer (BCP) thin films for surface nanopatterning is a promising approach for next-generation nanolithography. Thus, the creation of precise nanostructures from self-organized polymer nanodomains is investigated by academic research groups as well as R&D units of global players in semiconductor and data storage industries. Recently, significant advances have been made in controlling the polymer self-assembly into nanodomains of a particular shape at pre-defined positions and with a long-range order. Such guiding and controlling of the BCP self-assembly process renders this bottom–up technique competitive to conventional top–down lithography techniques, while allowing for a faster processing of large areas at lower costs.

Currently, feature size minimization, nanodomain definition, as well as pattern transfer to inorganic materials are studied intensely to enable full compatibility to semiconductor processing at industrial scale and to pave the way toward innovative novel fields of BCP application.

In this Special Issue, we compile and present recent findings in advancing block copolymer self-assembly to a highest-precision nanolithography technique. The aim is to shine a light on the rapidly developing field of BCP-based lithography. State-of-the-art reviews as well as articles on original novel fundamental and applied research on aspects including, but not limited to, the topics below are welcome in this Special Issue.

Dr. Katharina Brassat
Prof. Dr. Jörg K. N. Lindner
Guest Editors

Manuscript Submission Information

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Keywords

  • Block copolymer self-assembly
  • High-X block copolymers
  • Sub-10 nm lithography
  • Directed self-assembly of block copolymers
  • BCP thin film dewetting
  • BCP pattern transfer to substrates
  • BCP/Homopolymer blends
  • Simulation of block copolymer self-assembly
  • (Analytical) electron microscopy of polymer nanodomains
  • Sequential infiltration synthesis
  • Applications of BCP nanostructures
  • Metrology for large-area BCP patterned films and surfaces

Published Papers (4 papers)

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Research

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14 pages, 5205 KiB  
Article
Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature
by Elisheva Michman, Meirav Oded and Roy Shenhar
Polymers 2022, 14(12), 2377; https://doi.org/10.3390/polym14122377 - 12 Jun 2022
Cited by 2 | Viewed by 4133
Abstract
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on [...] Read more.
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features. Full article
(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)
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12 pages, 7978 KiB  
Article
Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer
by Anette Löfstrand, Alexei Vorobiev, Muhammad Mumtaz, Redouane Borsali and Ivan Maximov
Polymers 2022, 14(4), 654; https://doi.org/10.3390/polym14040654 - 10 Feb 2022
Cited by 1 | Viewed by 1881
Abstract
Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 [...] Read more.
Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 nm feature pattern transfer. By optimizing the amount of infiltrated material, the etch selectivity should be further improved. Here, an investigation of semi-static sequential infiltration synthesis of trimethyl aluminum (TMA) and water into maltoheptaose (MH) films, and into hydroxyl-terminated poly(styrene) (PS-OH) films, was performed, by varying the process parameters temperature, precursor pulse duration, and precursor exposure length. It was found that, by decreasing the exposure time from 100 to 20 s, the volumetric percentage on included pure Al2O3 in MH could be increased from 2 to 40 vol% at the expense of a decreased infiltration depth. Furthermore, the degree of infiltration was minimally affected by temperature between 64 and 100 °C. Shorter precursor pulse durations of 10 ms TMA and 5 ms water, as well as longer precursor pulses of 75 ms TMA and 45 ms water, were both shown to promote a higher degree, 40 vol%, of infiltrated alumina in MH. As proof of concept, 12 nm pitch pattern transfer into silicon was demonstrated using the method and can be concluded to be one of few studies showing pattern transfer at such small pitch. These results are expected to be of use for further understanding of the mechanisms involved in sequential infiltration synthesis of TMA/water into MH, and for further optimization of carbohydrate-based etch masks for sub-10 nm pattern transfer. Enabling techniques for high aspect ratio pattern transfer at the single nanometer scale could be of high interest, e.g., in the high-end transistor industry. Full article
(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)
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Review

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19 pages, 5386 KiB  
Review
Liquid Phase Infiltration of Block Copolymers
by Irdi Murataj, Eleonora Cara, Nicoletta Baglieri, Candido Fabrizio Pirri, Natascia De Leo and Federico Ferrarese Lupi
Polymers 2022, 14(20), 4317; https://doi.org/10.3390/polym14204317 - 14 Oct 2022
Cited by 2 | Viewed by 1638
Abstract
Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material [...] Read more.
Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material properties to its functionalities. Self-assembling materials such as block copolymers (BCPs), in combination with liquid phase infiltration (LPI) processes, represent an ideal strategy for the synthesis of inorganic materials into even more complex and functional features. This review provides an overview of the mechanism involved in the LPI, outlining the role of the different polymer infiltration parameters on the resulting material properties. We report newly developed methodologies that extend the LPI to the realisation of multicomponent and 3D inorganic nanostructures. Finally, the recently reported implementation of LPI into different applications such as photonics, plasmonics and electronics are highlighted. Full article
(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)
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19 pages, 5100 KiB  
Review
Polymer Vesicles for Antimicrobial Applications
by Hui Sun, Yin Wang and Jiahui Song
Polymers 2021, 13(17), 2903; https://doi.org/10.3390/polym13172903 - 28 Aug 2021
Cited by 9 | Viewed by 2605
Abstract
Polymer vesicles, hollow nanostructures with hydrophilic cavity and hydrophobic membrane, have shown significant potentials in biomedical applications including drug delivery, gene therapy, cancer theranostics, and so forth, due to their unique cell membrane-like structure. Incorporation with antibacterial active components like antimicrobial peptides, etc., [...] Read more.
Polymer vesicles, hollow nanostructures with hydrophilic cavity and hydrophobic membrane, have shown significant potentials in biomedical applications including drug delivery, gene therapy, cancer theranostics, and so forth, due to their unique cell membrane-like structure. Incorporation with antibacterial active components like antimicrobial peptides, etc., polymer vesicles exhibited enhanced antimicrobial activity, extended circulation time, and reduced cell toxicity. Furthermore, antibacterial, and anticancer can be achieved simultaneously, opening a new avenue of the antimicrobial applications of polymer vesicles. This review seeks to highlight the state-of-the-art of antimicrobial polymer vesicles, including the design strategies and potential applications in the field of antibacterial. The structural features of polymer vesicles, preparation methods, and the combination principles with antimicrobial active components, as well as the advantages of antimicrobial polymer vesicles, will be discussed. Then, the diverse applications of antimicrobial polymer vesicles such as wide spectrum antibacterial, anti-biofilm, wound healing, and tissue engineering associated with their structure features are presented. Finally, future perspectives of polymer vesicles in the field of antibacterial is also proposed. Full article
(This article belongs to the Special Issue Self-Assembled Block Copolymer Thin Films and Their Applications)
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