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Laser Hyperdoped and/or Textured Silicon: Universal Response from UV till Far-IR Range

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Materials Physics".

Deadline for manuscript submissions: closed (10 October 2023) | Viewed by 1513

Special Issue Editors


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Guest Editor
Department of Laser and Opto-Electronic Systems, Bauman Moscow State Technical University, Moscow 105005, Russia
Interests: optoelectronic devices; hyperdoped silicon; IR-imaging

Special Issue Information

Dear Colleagues,

Silicon remains the basic reliable CMOS-compatible material platform for most multi-functional optoelectronic devices. Being IR-blind, it could become a universal UV–mid-IR photosensitive material via donor or acceptor hyperdoping and annealing procedures.
This Special Issue summarizes the recent advances in hyperdoping technologies, annealing regimes, chemical and structural characterization, electrical properties and spectral response of hyperdoped silicon, for its perspective optoelectronic applications.

Key topics:

  • hyperdoping technologies;
  • annealing regimes;
  • chemical and structural characterization;
  • electrical properties;
  • spectral response;
  • optoelectronic integration.

Dr. Sergey I. Kudryashov
Dr. Michael Kovalev
Guest Editors

Manuscript Submission Information

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Keywords

  • hyperdoped silicon
  • nano- and microstructuring
  • hyperdoping technologies
  • annealing regimes
  • chemical and structural characterization
  • electrical properties
  • UV–mid-IR spectral response
  • optoelectronics
  • photovoltaics
  • optoelectronic integration

Published Papers (1 paper)

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Research

11 pages, 3809 KiB  
Article
Au-Hyperdoped Si Nanolayer: Laser Processing Techniques and Corresponding Material Properties
by Michael Kovalev, Alena Nastulyavichus, Ivan Podlesnykh, Nikita Stsepuro, Victoria Pryakhina, Evgeny Greshnyakov, Alexey Serdobintsev, Iliya Gritsenko, Roman Khmelnitskii and Sergey Kudryashov
Materials 2023, 16(12), 4439; https://doi.org/10.3390/ma16124439 - 16 Jun 2023
Cited by 2 | Viewed by 1025
Abstract
The absorption of light in the near-infrared region of the electromagnetic spectrum by Au-hyperdoped Si has been observed. While silicon photodetectors in this range are currently being produced, their efficiency is low. Here, using the nanosecond and picosecond laser hyperdoping of thin amorphous [...] Read more.
The absorption of light in the near-infrared region of the electromagnetic spectrum by Au-hyperdoped Si has been observed. While silicon photodetectors in this range are currently being produced, their efficiency is low. Here, using the nanosecond and picosecond laser hyperdoping of thin amorphous Si films, their compositional (energy-dispersion X-ray spectroscopy), chemical (X-ray photoelectron spectroscopy), structural (Raman spectroscopy) and IR spectroscopic characterization, we comparatively demonstrated a few promising regimes of laser-based silicon hyperdoping with gold. Our results indicate that the optimal efficiency of impurity-hyperdoped Si materials has yet to be achieved, and we discuss these opportunities in light of our results. Full article
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