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Special Issue "Laser-Induced Damage Properties of Optical Materials"

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A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Inorganic Crystalline Materials".

Deadline for manuscript submissions: 31 July 2023 | Viewed by 3768

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Special Issue Editors

Dr. Laixi Sun

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Guest Editor

Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang 621900, China
Interests: laser induced damage; optical materials; light-matter interaction; subsurface damage; silica; etching; plasma; optical finishing; optical fabrication; nanostructures

Dr. Yafei Lian

E-Mail Website
Guest Editor

Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai 201800, China
Interests: crystal growth; laser induced damage; optical materials; light-matter interaction; crystals; nonlinear optics; potassium dihydrogen phosphate; laser conditioning

Dr. Jin Huang

E-Mail Website
Guest Editor

Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang 621900, China
Interests: laser induced damage; optical materials; light-matter interaction; advanced surface process; photo-thermal absorption; laser induced fluorescence; defects detect

Special Issue Information

Dear Colleagues,

Optical materials (such as fused silica, single crystal silicon, and KDP crystal) of laser systems can be damaged by laser radiation of sufficiently high power or energy. Damage behavior generally arises from the localized coupling of laser energy into material, leading to sufficiently rapid heating to induce a permanent material breakdown. Over the past dozen years, the laser-induced damage properties of optical materials have been extensively studied. With fused silica, for example, numerous efforts have been made to increase the surface damage threshold of the optics operating at UV wavelengths. These efforts include improvements of material quality and finishing technology, together with the use of improved methodologies for detecting, diagnosing, and eliminating near-surface defects that can be introduced during the grinding and polishing of optics. Various mechanisms that can facilitate the damage initiation process have been demonstrated. The main mechanisms include: (1) pre-existing absorbing defect structures, (2) pre-existing atomic defects or creation as a result of material–laser interaction, (3) micro-/nanoscale particle contamination, and (4) organic contamination from the environment or the manufacturing process. Continual improvement of damage resistance and deep understanding of damage mechanisms of optical materials are still required for better applications. The purpose of the Special Issue is to exchange recent progress in laser-induced damage properties of optical materials for high-power or high-energy lasers, including laser-induced damage mechanisms, materials and film preparation, durability, properties modeling, testing, and component fabrication.

Dr. Laixi Sun
Dr. Yafei Lian
Dr. Jin Huang
Guest Editors

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Keywords

optical materials
laser-induced damage
damage growth
damage resistance
optical properties
optical finishing
subsurface damage
light–matter interaction
surface defects
surface modification
damage mechanisms
optics processing
laser damage testing
indentation
etching
grinding and polishing
fractures

Published Papers (6 papers)

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Research

Open AccessArticle

Laser Damage Performance Study of Fundamental Frequency Dielectric Film Optical Elements

and

Crystals 2023, 13(4), 571; https://doi.org/10.3390/cryst13040571 - 27 Mar 2023

Viewed by 493

Abstract

In laser application systems, the optical film is one of the most important parts of the system, as well as its weakest link. Its damage performance determines the output characteristics and safety performance of the laser system. This paper focuses on the fundamental frequency reflection of dielectric films used in large high-powered laser devices. The study of the dielectric film’s initial laser damage performance and laser damage growth performance is carried out through laser damage testing and microscopic morphology testing of the damage. The results show two different damage morphologies: type 1 damage (film discoloration damage) and type 2 damage (cratered damage), and the damage growth behavior between the two is very different, with type 1 damage not growing and type 2 damage growing rapidly under subsequent episodes that trigger their damage fluxes. The difference in the growth behavior is well explained by the micro-zone surface shape of the damage location. The results of this paper help to deepen the understanding of the dielectric membrane element processing process and the damage growth behavior. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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Open AccessFeature PaperArticle

Evolution Regularity of Continuous Surface Structures Shaped by Laser-Supported Fictive-Temperature Modifying

and

Crystals 2023, 13(3), 542; https://doi.org/10.3390/cryst13030542 - 22 Mar 2023

Viewed by 464

Abstract

The influence of residual heat on the fictive temperature modification zone of fused silica for different CO₂ laser scanning time intervals was investigated to precisely control the profiles of hydrofluoric (HF) acid-etched fused silica surface, which were formed by the increasing HF acid-etching rate for fused silica with increasing fictive temperature induced by CO₂ laser scanning. The surface profiles of HF acid-etched fused silica treated by different scanning time intervals of CO₂ laser were measured by a stylus profilometry, and experimental results indicate that the CO₂ laser scanning time intervals intensively influence the HF acid-etched surface profiles of fused silica. The increasing depth of surface profiles treated by shorter scanning time intervals shows that the fictive temperature modification zone significantly expands. Numerical simulations of the fictive temperature modification zone induced by different scanning time intervals indicate that the residual heat of CO₂ laser scanning with shorter time intervals leads to a dramatical increase in the fictive temperature modification zone. By adjusting the residual heat of CO₂ laser scanning intervals, various surface profiles of fused silica can be obtained by HF acid-etching of fused silica. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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Open AccessArticle

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO₂ Antireflection Film

and

Crystals 2023, 13(3), 477; https://doi.org/10.3390/cryst13030477 - 10 Mar 2023

Viewed by 509

Abstract

SiO₂ sol-gel antireflection film coated on fused silica can reduce the reflection loss and improve the transmittance of the optical component, although it is still prone to laser induced damage. Laser conditioning is an effective way to improve the laser induced damage threshold (LIDT) of SiO₂ sol-gel antireflection film. In this paper, single-layer SiO₂ sol-gel antireflection films pretreated by triple-frequency laser with different parameters are characterized by the macroscopical parameters, such as transmittance, refractive index, and thickness. The law of surface modification and the defect removal mechanism of the SiO₂ sol-gel antireflection film by laser conditioning are obtained. It is found that laser conditioning can reduce the thickness of the film and introduce densification. In addition, laser conditioning can eliminate micro-defects, such as vacancies and voids in the preparation of SiO₂ sol-gel antireflection films, which is the main reason to improve the laser damage resistance of films. Finally, the laser conditioning process with three step laser energy combinations of (0.2–0.6–1.0) F_th0 (zero damage threshold) is the best one to obtain high transmittance, and excellent effects on structure modification and defect removal of films. The research in this paper provides data support for the engineering application and mechanism research of laser conditioning. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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Open AccessArticle

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

and

Crystals 2023, 13(2), 309; https://doi.org/10.3390/cryst13020309 - 13 Feb 2023

Viewed by 477

Abstract

Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO₂ or femtosecond laser. Subsequently, homogenization and residual stress removal are required because of the microcracks and thermal accumulation generated with the ablation. As a result, the repair efficiency is greatly restricted. In this paper, a new method using in-volume, selective femtosecond laser-induced etching to repair the damage of fused silica is proposed. The region irradiated by femtosecond laser becomes more susceptible to the etching solution due to its constitutive characteristics having undergone chemical restructuring. In this way, material nearby the damaged area transparent to the laser radiation is modified locally inside the volume. A femtosecond laser is used to scan the damaged area with a 3D hollow trajectory. The applicable modification of fused silica occurs when the single pulse energy is approximately 2 μJ to 5 μJ, the repetition frequency is approximately 200 kHz to 500 kHz, and the scanning speed is approximately 10 mm/s. Then, the etching solution reacts quickly along the 3D profile of the modified path, and the damaged area is removed as a whole piece. This method can greatly reduce the workload of repair, and the etching process of fused silica is carried out synchronously. So, the etching efficiency is not affected by the number of damage points. In addition, the weak reaction between the etching solution and the substrate could homogenize the interface. It provides an efficient way to repair the surface damage of fused silica. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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Open AccessArticle

Influence of Ambient Humidity on the Performance of Complex Spectral Dielectric Films on SiO₂/K9 Substrates

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Crystals 2023, 13(2), 248; https://doi.org/10.3390/cryst13020248 - 01 Feb 2023

Viewed by 667

Abstract

Ambient humidity is an important factor to consider when maintaining dielectric films’ component performance. Herein, humidity-influenced experiments were conducted on complex spectral dielectric films based on SiO₂ and K9 substrates. Firstly, complex spectral dielectric films’ spectral and surface stresses in different humidity environments were measured. Subsequently, laser-induced damage threshold measurements were carried out on these components. The experimental results indicate that the environmental humidity will induce the evolution of the internal structure of the dielectric films on the mirror, resulting in the deformation of the coating surface and a slight shift of the reflection spectrum. At the same time, the environmental humidity also greatly influences the anti-laser damage performance of the dielectric film mirror. Dielectric films based on SiO₂ have excellent damage resistance in high-humidity environments. Conversely, K9-based dielectric films have better damage resistance in low-humidity environments. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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Open AccessArticle

Laser Irradiation Behavior of Carbon Fiber Epoxy Resin Composites with Laminar Structure

Alexandr. A. Rogachev

and

Lihong Gao

Crystals 2022, 12(12), 1767; https://doi.org/10.3390/cryst12121767 - 05 Dec 2022

Viewed by 678

Abstract

Laser attracts more attention and it could cause material failure by its high energy. Carbon fiber resin composites are widely used in aerospace vehicles experiencing dramatic damage to their surface if exposed to high-energy laser irradiation. The available studies on irradiation behavior are mainly focused on pulsed lasers and bulk composites, and investigations of thin laminar structures under continuous-wave laser irradiation have rarely been reported. In this study, the damage behavior of laminar carbon fiber epoxy resin composites (CFE composites) was studied. Using a threshold model of resin pyrolysis, CFE composite is observed to be damaged at 0.18 s when irradiated at 100 W/cm², and if the laser power density is increased to 200 W/cm² for 2 s, no resin remains on the fiber surface, which is now completely exposed. With an increase in power density and irradiation time, the ablation rate always shows an upward trend: the ablation region expands and the separation of layers in the interior appears, which can reach 0.01156 g/s when irradiated at 100 W/cm² for 5 s. The damage mechanism of CFE composite was also revealed by the temperature evolution data, thermogravimetric analysis, and composition change. Full article

(This article belongs to the Special Issue Laser-Induced Damage Properties of Optical Materials)

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