Special Issue "Fabrication, Structures and Properties of High Entropy Alloys and Refractory High Entropy Alloys"

A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Crystalline Metals and Alloys".

Deadline for manuscript submissions: 30 June 2023 | Viewed by 767

Special Issue Editor

Institut Jean Lamour and Faculty of Sciences and Technologies, University of Lorraine, Nancy, France
Interests: elaboration; microstructures and properties of superalloys and dental alloys (mechanical behavior, oxidation and corrosion)
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Over the past two decades, new generations of alloys of great potential interest for various applications, requiring good mechanical behavior and resistance, have attracted increasing attention. Some examples include High-Entropy Alloys (HEAs) for medium/high temperatures (e.g., around 1000°C) and Refractory High-Entropy Alloys (RHEA) for very high temperatures (largely beyond 1000°C). These new alloys may potentially lead to versions capable of competing with superalloys and refractory alloys, which are currently used in aeronautics (turbine disks, turbine blades, etc.) power generation (burners, hot turbine components, etc.) and various processes working at high temperature (glass industries, etc.). Some HEAs contain equimolar quantities of several elements among Fe, Co, Ni, Cr, Mn, Cu, etc., while RHEA involves refractory metals such as Mo, Ta, W, Hf, Zr or Nb. Numerous fabrication ways are considered to elaborate them, from conventional foundry to powder metallurgy, to produce structural materials or coatings.

Due to the relative youth of these high-temperature alloy families, many systems combining the previous elements or introducing new ones have yet to be investigated in the fields of compositions and structures, synthesis mode or utilization temperature, as well as various mechanical, chemical, thermal and physical properties.

This Special Issue provides an opportunity to disseminate the newest results obtained by researchers in all the above-mentioned domains.

Prof. Dr. Patrice Berthod
Guest Editor

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Crystals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thermodynamic modeling
  • casting
  • powder metallurgy
  • mechanical alloying
  • forging
  • microstructures
  • high-temperature mechanics
  • hot oxidation and corrosion
  • other properties

Published Papers (1 paper)

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Research

Article
Preparation of HfNbTiTaZr Thin Films by Ionized Jet Deposition Method
Crystals 2023, 13(4), 580; https://doi.org/10.3390/cryst13040580 - 28 Mar 2023
Viewed by 497
Abstract
The ionized jet deposition (IJD) method is applied to the preparation of thin films composed of refractory HfNbTiTaZr high-entropy alloy (HEA). Due to its stoichiometric reliability, the IJD method provides a flexible tool for deposition of complex multi-element materials, such as HEAs. Scanning [...] Read more.
The ionized jet deposition (IJD) method is applied to the preparation of thin films composed of refractory HfNbTiTaZr high-entropy alloy (HEA). Due to its stoichiometric reliability, the IJD method provides a flexible tool for deposition of complex multi-element materials, such as HEAs. Scanning electron microscopy, energy-dispersion spectroscopy, confocal microscopy, and X-ray diffraction methods are used to characterize the influence of the applied accelerating voltage of the IJD deposition head ranging from 16 to 22 kV on the resulting morphology, chemical composition, thickness, crystalline structure, and phase composition of the layers prepared as 10 mm-wide strips on a single stainless-steel substrate. With a low accelerating voltage applied, the best surface homogeneity is obtained. Transfer coefficient values characterizing the elemental transport between the bulk target and the grown layer are evaluated for each constituting element and applied voltage. With the IJD accelerating voltage approaching 22 kV, the coefficients converge upon the values proportional to the atomic number of the element. Such voltage dependence of the IJD elemental transport might be used as a suitable tool for fine-tuning the elemental composition of layers grown from a single deposition target. Full article
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