Preparation and Properties of Alloys by Physical Vapor Deposition

A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Crystalline Metals and Alloys".

Deadline for manuscript submissions: closed (31 December 2023) | Viewed by 1361

Special Issue Editors


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Guest Editor
Institute of Advanced Technology, Shandong University, Jinan, China
Interests: physical vapor deposition; thermodynamic calculation; catalytic property; mechanical property; aluminium alloy

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Guest Editor
Institute of Novel Semiconductors, Shandong University, Jinan, China
Interests: crystal growth; wide bandgap semiconductor; compound semiconductor; dislocation characterization; X-ray diffraction

Special Issue Information

Dear Colleagues,

Sida Liu is now a professor of Shandong University, a national young talent. The self-designed and improved Al-Ti-B-C (TCB) seed alloy series products have been exported to more than ten countries such as Germany, Italy and Korea, and have been promoted and applied in well-known enterprises. Presided over or participated in many research projects in Mainland China, Hong Kong, Germany, etc. He has published more than 20 SCI papers in Science Advances, Acta Materialia, JACS, Materials Today and other journals, including more than 10 papers by the first/corresponding author, and served as guest editor of Crystal. The research experience has been reported by CCTV, DAAD and other media or institutions.

Xuejian Xie is now a professor of Shandong University, "Qilu Young Scholar". He has been mainly engaged in the single ctystal growth and performance characterization of wide bandgap semiconductor materials. Till now, he has published more than 30 SCI/EI papers, authorized 6 invention patents. He has also undertaken the national and provincial level scientific projects as project leader such as National Natural Science Foundation of China and take part in National key research and development program as key member.

Prof. Dr. Sida Liu
Dr. Xuejian Xie
Prof. Dr. Umberto Prisco
Guest Editors

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Keywords

  • physical vapor deposition
  • thermodynamic calculation
  • catalytic property
  • mechanical property
  • aluminium alloy
  • crystal growth
  • compound semiconductor
  • dislocation characterization

Published Papers (1 paper)

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Research

12 pages, 2166 KiB  
Article
Preparation of FeNiCoCrCu Thin Films by Ionized Jet Deposition Method: Determination of Elemental Transfer Coefficients
by Jáchym Lis, Jakub Skočdopole, Petr Jaroš, Jiří Čapek, Karel Trojan, Martin Dráb, Monika Kučeráková, Stanislav Vratislav and Ladislav Kalvoda
Crystals 2024, 14(3), 263; https://doi.org/10.3390/cryst14030263 - 07 Mar 2024
Viewed by 791
Abstract
Investigation of high-entropy alloys in form of bulk samples as well as thin films is currently one of the fastest growing areas in the study of metal alloys. In this paper, a bulk sample of FeNiCoCuCr high-entropy alloy ingot with equimolar composition is [...] Read more.
Investigation of high-entropy alloys in form of bulk samples as well as thin films is currently one of the fastest growing areas in the study of metal alloys. In this paper, a bulk sample of FeNiCoCuCr high-entropy alloy ingot with equimolar composition is prepared by the laboratory arc melting method under an argon atmosphere and used as a source target for deposition of thin films on Si (111) single-crystalline substrates using a novel ionized jet deposition method. The morphology, chemical composition, and real crystalline structure of the target and the prepared layers were characterized by scanning electron microscopy, atomic force microscopy, energy-dispersive X-ray spectroscopy, and X-ray and neutron diffraction methods. Transfer coefficients characterizing the mass transport between the target and the grown film were calculated for each of the constituting metallic elements as the ratio of the atomic concentration found in the prepared film divided by its concentration in the deposition target. The dependence of the obtained transfer coefficients on the IJD acceleration voltage is discussed with respect to the main physical and geometric parameters of the deposition process, and their correlations with the cohesive energy of the elements forming the HEA are proposed. Full article
(This article belongs to the Special Issue Preparation and Properties of Alloys by Physical Vapor Deposition)
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