Complex Oxide Thin Films

A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Inorganic Crystalline Materials".

Deadline for manuscript submissions: 31 October 2024 | Viewed by 104

Special Issue Editors

Pacific Northwest National Laboratory, Richland, WA 99354, USA
Interests: functional oxides; epitaxial oxide thin films; structure–property relationship; electron microscopy; X-ray and neutron diffraction
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, WA, 99352 USA
Interests: energy materials; microstructural characterizations; oxide thin films; electron spectroscopy
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Guest Editor
Max Planck Institute for Solid State Research, 70569 Stuttgart, Germany
Interests: advanced electron microscopy and spectroscopy; heterostructures and interfaces; functional thin films

Special Issue Information

Dear Colleagues,

Complex metal oxides are a very important class of materials because of their very interesting fundamental scientific phenomena and very appealing physical properties for practical applications. In particular, thin films of complex metal oxides, down to the nanoscale, represent an important set of such materials for both fundamental research and technological applications. When epitaxially grown on a single-crystal substrate, the properties of complex oxide thin films can be potentially engineered by the lattice of the substrate, showing distinct properties of their bulk form. More interestingly, complex oxide interfaces can exhibit emergent physical and chemical properties markedly different from those of the bulk materials on either side.
This Special Issue focuses on complex oxide thin films and aims to reflect recent advances in the range of new oxide thin films synthesized, new thin film growth methods, new physical properties discovered from oxide thin films, and perspectives on the future development of oxide thin films. With all these collections, it is hoped that this Special Issue will provide the community with a platform to exchange recent works, gain a good understanding about the progress of this field, and inspire new ideas to advance oxide thin film research.

Dr. Peng Zuo
Dr. Yaobin Xu
Dr. Hongguang Wang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Crystals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • complex oxide thin films
  • novel thin films /membrane
  • new film growth method
  • film/substrate interface
  • physical properties
  • structural characterization

Published Papers

This special issue is now open for submission.
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