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Coatings
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Advances in Coatings Vacuum Deposition Systems
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Advances in Coatings Vacuum Deposition Systems

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: closed (21 September 2018) | Viewed by 47522

Special Issue Editor

Dr. Francisco J. G. Silva

E-Mail Website
Guest Editor
Department of Mechanical Engineering, ISEP–School of Engineering, Polytechnic of Porto, 4200-072 Porto, Portugal
Interests: tribology; coatings; manufacturing processes
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

This Special Issue aims to provide a forum for the latest developments in "Coating Vacuum Deposition Systems", taking into account the accelerating evolution of technology, scientists and customers' requirements, new demands on coating characteristics, and so on. The objective of the Special Issue is to disseminate fundamental theoretical knowledge, necessary to support comprehensive knowledge regarding the latest developments in deposition techniques and devices used to produce advanced coatings. Topics should focus on reactors typology, reactors thermal and energetic efficiency, new devices used to improve the coatings adhesion, techniques and systems to produce graduate and nanostructured films, upgrades carried out on standard reactors in order to get better performance or coatings with improved characteristics, systems and techniques used to increase the deposition rate or get a better performance on the plasma distribution into the reactor, as well as empirical research to address significant theoretical and practical issues in the following areas:

  • PVD Reactors typology (state-of-the-art)
  • CVD Reactors typology (state-of-the-art)
  • Techniques able to improve deposition rate
  • Devices able to induce a better adhesion between coatings and substrates
  • Plasma enhancers
  • Large-scale deposition reactors
  • Atmospheric plasma
  • Devices and techniques to improve the coatings uniformity
  • How to enhance the PVD and CVD processes sustainability
  • How to save energy in advanced deposition processes
  • How to improve the nanostructured coatings deposition
  • How to increase the mechanical properties of the deposited films
  • Techniques and devices to improve the multilayered films deposition
  • In situ measurements, carried out during the deposition process
  • Simulation applied to advanced coating deposition processes

Prof. Dr. Francisco J. G. Silva
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (3 papers)

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Research

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11 pages, 3881 KiB  
Article
The Properties of Binary and Ternary Ti Based Coatings Produced by Thermionic Vacuum Arc (TVA) Technology
by Aurelia Mandes, Rodica Vladoiu, Gabriel Prodan, Virginia Dinca, Corneliu Porosnicu and Paul Dinca
Coatings 2018, 8(3), 114; https://doi.org/10.3390/coatings8030114 - 20 Mar 2018
Cited by 9 | Viewed by 4668
Abstract
A series of the multicomponent thin films (binary: Ti-C; Ti-Ag and ternary: Ti-C-Ag; Ti-C-Al) were fabricated by Thermionic Vacuum Arc (TVA) technology in order to study the wear resistance and the anticorrosion properties. The effects of Ti amount on the microstructure, tribological and [...] Read more.
A series of the multicomponent thin films (binary: Ti-C; Ti-Ag and ternary: Ti-C-Ag; Ti-C-Al) were fabricated by Thermionic Vacuum Arc (TVA) technology in order to study the wear resistance and the anticorrosion properties. The effects of Ti amount on the microstructure, tribological and morphological properties were subsequently investigated. TVA is an original deposition method using a combination of anodic arc and electron gun systems for the growth of films. The samples were characterized using scanning electron microscope (SEM) and a transmission electron microscope (TEM) accompanied by selected area electron diffraction (SAED). Tribological properties were studied by a ball-on-disc tribometer in the dry regime and the wettability was assessed by measuring the contact angle with the See System apparatus. Wear Rate results indicate an improved sliding wear behavior for Ti-C-Ag: 1.31 × 10−7 mm3/N m (F = 2 N) compared to Ti-C-Al coating wear rate: 4.24 × 10−7 mm3/N m. On the other hand, by increasing the normal load to 3 N an increase to the wear rate was observed for Ti-C-Ag: 2.58 × 10−5 mm3 compared to 2.33 × 10−6 mm3 for Ti-C-Al coating. Full article
(This article belongs to the Special Issue Advances in Coatings Vacuum Deposition Systems)
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Review

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21 pages, 2140 KiB  
Review
Numerical Simulation Applied to PVD Reactors: An Overview
by Gustavo Pinto, Francisco Silva, Jacobo Porteiro, José Míguez and Andresa Baptista
Coatings 2018, 8(11), 410; https://doi.org/10.3390/coatings8110410 - 19 Nov 2018
Cited by 10 | Viewed by 7014
Abstract
The technological evolution in the last century also required an evolution of materials and coatings. Therefore, it was necessary to make mechanical components subject to heavy wear more reliable, improving their mechanical strength and durability. Surfaces can contribute decisively to extending the lifespan [...] Read more.
The technological evolution in the last century also required an evolution of materials and coatings. Therefore, it was necessary to make mechanical components subject to heavy wear more reliable, improving their mechanical strength and durability. Surfaces can contribute decisively to extending the lifespan of mechanical components. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) technologies have emerged to meet the new requirements that have enabled a remarkable improvement in the morphology, composition and structure of films as well as an improved adhesion to the substrate allowing a greater number of diversified applications. Thin films deposition using PVD coatings has been contributing to tribological improvement, protecting their surfaces from wear and corrosion, as well as enhancing their appearance. This process can be an advantage over other processes due to their excellent properties and environmental friendly behavior, which gives rise to a large number of studies in mathematical modelling and numerical simulation, like finite element method (FEM) and computational fluid dynamics (CFD). This review intends to contribute to a better PVD process knowledge, in the fluids and heat area, using CFD simulation methods focusing on the process energy efficiency improvement regarding the industrial context with the sputtering technique. Full article
(This article belongs to the Special Issue Advances in Coatings Vacuum Deposition Systems)
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22 pages, 6962 KiB  
Review
Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands
by Andresa Baptista, Francisco Silva, Jacobo Porteiro, José Míguez and Gustavo Pinto
Coatings 2018, 8(11), 402; https://doi.org/10.3390/coatings8110402 - 14 Nov 2018
Cited by 257 | Viewed by 35027
Abstract
Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. [...] Read more.
Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand. Full article
(This article belongs to the Special Issue Advances in Coatings Vacuum Deposition Systems)
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