Thin Films and Patterned Structures by Electrochemical Methods

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: closed (15 March 2018) | Viewed by 44962

Special Issue Editors


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Guest Editor
Departament de Física, Universitat Autonoma de Barcelona, 08193 Bellaterra, Barcelona, Spain
Interests: electrodeposition; alloys; mesoporous films; electrocatalysis; magnetic properties
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Guest Editor
Group of Smart Nanoengineered Materials, Nanomechanics and Nanomagnetism, Physics Department, Sciences Faculty, Building Cc, Universitat Autònoma de Barcelona, E-08193 Bellaterra, Spain
Interests: thin films; lithographed structures; nanomagnetism; mechanical properties
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

We would like to invite you to submit your work to this Special Issue on "Thin Films and Patterned Structures by Electrochemical Methods". Among the diverse techniques to grow continuous or patterned metallic films (chemical vapour deposition, physical vapour deposition, sputtering, etc.), electrodeposition (ED) stands out from the rest for several reasons: simple set-up; cost-effectiveness; it works at ambient pressure; deposition can be performed onto a wide variety of substrate shapes (also parts with undercuts); ease of operation; fast deposition rates; and ability to grow relatively thick homogeneous coatings. ED allows fine-tuning of the properties of deposits by modulating factors such as the pH and temperature of the electrolytic bath, additives, the deposition mode (direct versus pulse methods), etc. Furthermore, ED is widely employed for the fabrication of multilayered coatings consisting of few nanometer-thick alternating layers, composites made of nanoparticles embedded in a metallic matrix, 1D nanostructures (nanowires, nanopillars, nanotubes) and 0D (nanoparticles). In combination with photolithography or e-beam lithography, ED has been used to fabricate relatively complex wirelessly controllable 3D micromachines and diverse MEMS/NEMS devices. Besides the use of ED to grow protective coatings, this technique has also found appealing applications in a large variety of technological areas, such as magnetism, tribology and tribo-corrosion, biomedicine or (electro)-catalysis, amongst others.

In particular, the topics of interest of this Special Issue include, but are not limited to:

  • Synthesis and structural characterization of electrodeposited functional coatings (metals, metallic alloys, polymers and oxides);
  • Electrodeposition of arrays of patterned micro- and nanostructures;
  • Green electrodeposition for sustainability applications;
  • Electrocatalysis based on fully-dense and porous films, micro- and nanostructures;
  • Magnetic performance of electrodeposited films and multilayers;
  • Corrosion and tribocorrosion resistance of electrodeposited coatings;
  • Mechanical and wear properties of electrodeposited thin films.

Dr. Eva Pellicer
Prof. Dr. Jordi Sort
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (8 papers)

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Research

11 pages, 5143 KiB  
Article
Superconducting Niobium Coatings Deposited on Spherical Substrates in Molten Salts
by Anton Dubrovskiy, Maksim Okunev, Olga Makarova and Sergey Kuznetsov
Coatings 2018, 8(6), 213; https://doi.org/10.3390/coatings8060213 - 04 Jun 2018
Cited by 14 | Viewed by 3850
Abstract
The interaction of substrates from ceramics, beryllium, and carbopyroceram with the electrolyte for the electrodeposition of niobium coatings was investigated. The corrosion resistance of spherical ceramic and beryllium samples with the protective molybdenum films obtained by magnetron sputtering was studied. The exfoliation of [...] Read more.
The interaction of substrates from ceramics, beryllium, and carbopyroceram with the electrolyte for the electrodeposition of niobium coatings was investigated. The corrosion resistance of spherical ceramic and beryllium samples with the protective molybdenum films obtained by magnetron sputtering was studied. The exfoliation of molybdenum film from ceramics and beryllium samples was observed after the experiments due to the interaction of substrates with the melt. It was found that the carbopyroceram did not corrode in the niobium containing melt and this material was chosen as the substrate for the electrodeposition of superconducting niobium coatings. The influence of the oxide ions on the electrochemical behavior of niobium complexes in the NaCl–KCl–NaF–K2NbF7 melt was studied. A special form of the cathode was constructed for the electrodeposition of niobium coatings on spherically shaped substrates. Electrodeposition of the niobium coatings on spheres 10 mm in diameter manufactured from carbopyroceram was carried out at 750 °C with the cathodic current density of 5 × 10−3–2 × 10−2 A·cm−2 and the electrolysis time of 8–12 h. Influence of the cathodic current density on the microstructure of niobium coatings was studied. The roughness, nonsphericity, and superconductive properties of niobium coatings were determined. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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9 pages, 2797 KiB  
Article
The Gain of Low Thermal Expansivity via Phase Transition in Electroformed Invar
by Yong Bum Park and In Gyeong Kim
Coatings 2018, 8(5), 169; https://doi.org/10.3390/coatings8050169 - 02 May 2018
Cited by 9 | Viewed by 6363
Abstract
In the organic light-emitting diode display industry, Invar exhibits anomalously low thermal expansivity and is, therefore, used as a material for fine metal masks, which are necessary components for the evaporation process of diode materials. We present an electroforming method for fabricating Fe-Ni [...] Read more.
In the organic light-emitting diode display industry, Invar exhibits anomalously low thermal expansivity and is, therefore, used as a material for fine metal masks, which are necessary components for the evaporation process of diode materials. We present an electroforming method for fabricating Fe-Ni alloys with a coefficient of thermal expansion lower than that of conventional Invar. The principle of controlling the thermal expansivity of electroformed Fe-Ni alloys is clarified in terms of the behavior of the phases constituting them. The cause of the Invar anomalies, which has not yet been fully elucidated, is explained by combining the Weiss model based on the electron configurations of Fe atoms and a model that we propose based on atom configurations. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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17 pages, 5900 KiB  
Article
Alkoxylated β-Naphthol as an Additive for Tin Plating from Chloride and Methane Sulfonic Acid Electrolytes
by Simona P. Zajkoska, Antonio Mulone, Wolfgang E. G. Hansal, Uta Klement, Rudolf Mann and Wolfgang Kautek
Coatings 2018, 8(2), 79; https://doi.org/10.3390/coatings8020079 - 21 Feb 2018
Cited by 9 | Viewed by 5702
Abstract
β-naphthol was one of the first additives introduced for smooth and homogeneous tin electrodeposition. Although it can be oxidized under the plating conditions, forming either 1,2-napthoquinone or polymeric materials based on naphthioxides, it is still in use. In this work, an investigation of [...] Read more.
β-naphthol was one of the first additives introduced for smooth and homogeneous tin electrodeposition. Although it can be oxidized under the plating conditions, forming either 1,2-napthoquinone or polymeric materials based on naphthioxides, it is still in use. In this work, an investigation of its more stable form, alkoxylated β-naphthol (ABN), on tin plating is undertaken. For this purpose, chloride based (pH ~5) and methane sulfonic acid (MSA, pH ~0.5) electrolytes, including ABN, were prepared. Reaction kinetics were studied by polarization, Tafel measurements, and cyclic voltammetry. Tin electrodeposits were obtained on flat brass substrates. Surface morphology and preferred crystal orientation were studied by Scanning Electron Microscopy (SEM) and X-ray Diffraction (XRD). In both studied electrolytes ABN acts as an inhibitor but in the case of the chloride electrolyte it is more pronounced. In the MSA electrolyte this effect was overlaid by the presence of tin-citrate complexes. In the chloride-based electrolyte, ABN has a grain refining effect, while in the MSA electrolyte an increase of ABN concentration leads to a slight enlargement of the average grain size. X-ray analysis shows a constant decrease of the (101) intensity with increasing concentration of ABN for the sample deposited from both baths. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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11 pages, 13468 KiB  
Article
Investigation of Electrochemically Deposited and Chemically Reduced Platinum Nanostructured Thin Films as Counter Electrodes in Dye-Sensitized Solar Cells
by Chih-Hung Tsai, Yu-Chen Hsiao and Ping-Yuan Chuang
Coatings 2018, 8(2), 56; https://doi.org/10.3390/coatings8020056 - 01 Feb 2018
Cited by 5 | Viewed by 5470
Abstract
In this paper, we demonstrated that platinum (Pt) counter electrodes (CEs) fabricated using electrochemical deposition and chemical reduction can replace conventional high-temperature thermally decomposed Pt electrodes. In this study, Pt electrodes were fabricated using thermal decomposition, electrochemical deposition, and chemical reduction, and the [...] Read more.
In this paper, we demonstrated that platinum (Pt) counter electrodes (CEs) fabricated using electrochemical deposition and chemical reduction can replace conventional high-temperature thermally decomposed Pt electrodes. In this study, Pt electrodes were fabricated using thermal decomposition, electrochemical deposition, and chemical reduction, and the influence of the different Pt counter electrodes on the efficiency of the dye-sensitized solar cells (DSSCs) was analyzed. The properties of the various Pt CEs were analyzed using scanning electron microscopy (SEM), surface area analysis, X-ray diffraction (XRD), electrochemical impedance spectroscopy (EIS), and cyclic voltammetry (CV). DSSCs with various Pt CEs were characterized using current density-voltage (J-V), incident photo-current conversion efficiency (IPCE), and EIS measurements. The results show that the power conversion efficiencies of these three types of DSSC devices were between 7.43% and 7.72%. The DSSCs based on the Pt electrode fabricated through electrochemical deposition exhibited the optimal power conversion efficiency. Because the processes of electrochemical deposition and chemical reduction do not require high-temperature sintering, these two methods are suitable for the fabrication of Pt on flexible plastic substrates. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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6159 KiB  
Article
Ammonia Generation via a Graphene-Coated Nickel Catalyst
by Fei Lu and Gerardine G. Botte
Coatings 2017, 7(6), 72; https://doi.org/10.3390/coatings7060072 - 27 May 2017
Cited by 4 | Viewed by 6449
Abstract
A novel graphene-coated Ni electrode was developed in this investigation to improve corrosion resistance while unexpectedly enhancing the ammonia generation rate in the electrochemically induced urea to ammonia (eU2A) process, which is an electrochemical onsite ammonia generation method. The development of the electrode [...] Read more.
A novel graphene-coated Ni electrode was developed in this investigation to improve corrosion resistance while unexpectedly enhancing the ammonia generation rate in the electrochemically induced urea to ammonia (eU2A) process, which is an electrochemical onsite ammonia generation method. The development of the electrode is crucial for the eU2A reactions since in the ammonia generation process, the concentration of ammonia is inevitably high on the surface of the electrode, leading to severe corrosion of the electrode and the loss of generated ammonia as well. In this paper, the graphene was derived from raw coal by using the chemical vapor deposition method and self-lifted onto a Ni electrode to form a protective layer for corrosion prevention. Transmission electron microscopy showed the synthesized graphene had few-layers and Raman spectroscopy indicated that the coating of graphene was stable during the eU2A reaction. As a result, the ammonia corrosion of the Ni electrode was dramatically reduced by ~20 times with the graphene coating method. More importantly, a higher ammonia generation rate (~2 times) was achieved using the graphene-coated Ni working electrode compared to a bare Ni electrode in the eU2A process. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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3203 KiB  
Article
Statistical Determination of a Fretting-Induced Failure of an Electro-Deposited Coating
by Kyungmok Kim
Coatings 2017, 7(4), 48; https://doi.org/10.3390/coatings7040048 - 31 Mar 2017
Cited by 5 | Viewed by 4654
Abstract
This paper describes statistical determination of fretting-induced failure of an electro-deposited coating. A fretting test is conducted using a ball-on-flat plate configuration. During a test, a frictional force is measured, along with the relative displacement between an AISI52100 ball and a coated flat [...] Read more.
This paper describes statistical determination of fretting-induced failure of an electro-deposited coating. A fretting test is conducted using a ball-on-flat plate configuration. During a test, a frictional force is measured, along with the relative displacement between an AISI52100 ball and a coated flat specimen. Measured data are analyzed with statistical process control tools; a frictional force versus number of fretting cycles is plotted on a control chart. On the control chart, critical number of cycles to coating failure is statistically determined. Fretted surfaces are observed after interrupting a series of fretting tests. Worn surface images and wear profiles provide that the increase on the kinetic friction coefficient after a steady-state sliding is attributed to the substrate enlarged at a contact surface. There is a good agreement between observation of worn surfaces and statistical determination for fretting-induced coating failure. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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4462 KiB  
Article
Static and Dynamic Magnetization Investigation in Permalloy Electrodeposited onto High Resistive N-Type Silicon Substrates
by Kenedy Freitas, José R. Toledo, Leandro C. Figueiredo, Paulo C. Morais, Jorlandio F. Felix and Clodoaldo I. L. De Araujo
Coatings 2017, 7(2), 33; https://doi.org/10.3390/coatings7020033 - 20 Feb 2017
Cited by 3 | Viewed by 5733
Abstract
The present study reports on the development of permalloy thin films obtained by electrodeposition onto low-doped n-type silicon substrates. While changing from non-percolated clusters into percolated thin films upon increasing the electrodeposition time, the static and dynamic magnetic properties of the as-obtained structures [...] Read more.
The present study reports on the development of permalloy thin films obtained by electrodeposition onto low-doped n-type silicon substrates. While changing from non-percolated clusters into percolated thin films upon increasing the electrodeposition time, the static and dynamic magnetic properties of the as-obtained structures were investigated. We found the experimental magnetic results to be in very good agreement with the simulations performed by solving the Landau-Lifshitz for the dynamics of the magnetic moment. For short electrodeposition times we found the static and dynamic magnetization behavior of the as-formed nanoclusters evidencing vortex magnetization with random chirality and polarization, which is explained in terms of dipolar interaction minimization. Indeed, it is herein emphasized that recent applications of ferromagnetic materials in silicon-based spintronic devices, such as logic and bipolar magnetic transistors and magnetic memories, have revived the possible utilization of low cost and simple electrodeposition techniques for the development of these upcoming hetero-nanostructured devices. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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3840 KiB  
Communication
Local Electrical Response in Alkaline-Doped Electrodeposited CuInSe2/Cu Films
by Javier A. Barón-Miranda, Octavio Calzadilla, Liliana E. Arvizu-Rodríguez, Jose L. Fernández-Muñoz, Cesia Guarneros-Aguilar, Fabio Chale-Lara, Ulises Páramo-García and Felipe Caballero-Briones
Coatings 2016, 6(4), 71; https://doi.org/10.3390/coatings6040071 - 20 Dec 2016
Cited by 2 | Viewed by 5647
Abstract
The local electrical response in alkaline-doped CuInSe2 films prepared by single-step electrodeposition onto Cu substrates was studied by current-sensing atomic force microscopy. The CuInSe2 (CIS) films were prepared from single baths containing the dopant ions (Li, Na, K or Cs) and [...] Read more.
The local electrical response in alkaline-doped CuInSe2 films prepared by single-step electrodeposition onto Cu substrates was studied by current-sensing atomic force microscopy. The CuInSe2 (CIS) films were prepared from single baths containing the dopant ions (Li, Na, K or Cs) and were studied by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and photocurrent response. Increased crystallinity and surface texturing as the ion size increased were observed, as well as an enhanced photocurrent response in Cs-doped CIS. Li- and Na-doped films had larger conductivity than the undoped film while the K- and Cs-doped samples displayed shorter currents and the current images indicated strong charge accumulation in the K- and Cs-doped films, forming surface capacitors. Corrected current-sensing AFM IV curves were adjusted with the Shockley equation. Full article
(This article belongs to the Special Issue Thin Films and Patterned Structures by Electrochemical Methods)
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