Editorial

4 pages, 192 KiB

Open AccessEditorial

Special Issue “Magnetron Sputtering Deposited Thin Films and Its Applications”

by Frédéric Sanchette and Alain Billard

Coatings 2020, 10(11), 1072; https://doi.org/10.3390/coatings10111072 - 07 Nov 2020

Cited by 8 | Viewed by 1500

The physical vapour deposition processes, and in particular different variants of sputtering, have reached a maturity making possible industrial applications in numerous fields such as mechanics [...] Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

Research

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12 pages, 3108 KiB

Open AccessArticle

Effect of Thermal Stresses Formed during Air Annealing of Amorphous Lanthanum Cuprate Thin Films Deposited on Silicon Substrate

by Nolwenn Tranvouez, Philippe Steyer, Annie Malchère, Pascal Boulet, Fabien Capon, Jean-Philippe Bauer and Jean-François Pierson

Coatings 2020, 10(7), 613; https://doi.org/10.3390/coatings10070613 - 29 Jun 2020

Cited by 7 | Viewed by 2409

Abstract

Amorphous thin films of La–Cu–O deposited by magnetron sputtering have been annealed at different temperatures and in situ analyzed by X-ray diffraction. These experiments were useful to determine the crystallization temperature and to follow the crystallization process of the film. The in situ [...] Read more.

Amorphous thin films of La–Cu–O deposited by magnetron sputtering have been annealed at different temperatures and in situ analyzed by X-ray diffraction. These experiments were useful to determine the crystallization temperature and to follow the crystallization process of the film. The in situ annealing X-ray diffraction analyses have been also used to determine the thermal expansion coefficient of La₂CuO₄ thin film. The estimated value is close to that obtained for a commercial powder. The thermal expansion coefficient value with additional environmental scanning electron microscopy observations explains the delamination origin that occurs during the annealing before the crystallization step. The buckling and delamination of the film observed is caused by the thermal expansion coefficient mismatch of the film and the substrate. During the heating step, the mismatch generates compressive stress at the film/substrate interface, causing the film to lift off and crack in the typical way. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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11 pages, 2770 KiB

Open AccessArticle

Effect of Tantalum Addition on Properties of Cu–Zr–Based Thin Film Metallic Glasses (TFMGs)

by Sofiane Achache and Frederic Sanchette

Coatings 2020, 10(6), 515; https://doi.org/10.3390/coatings10060515 - 28 May 2020

Cited by 13 | Viewed by 2405

Abstract

Cu–Zr–Ta ternary thin film metallic glasses (TFMGs) were deposited through the direct current (DC) magnetron sputtering of pure metallic targets in a dynamic mode. The effect of tantalum addition on the microstructure, mechanical properties, and thermal behavior of TFMGs were investigated. Nanoindentation measurements [...] Read more.

Cu–Zr–Ta ternary thin film metallic glasses (TFMGs) were deposited through the direct current (DC) magnetron sputtering of pure metallic targets in a dynamic mode. The effect of tantalum addition on the microstructure, mechanical properties, and thermal behavior of TFMGs were investigated. Nanoindentation measurements showed that an increase in tantalum content from 0 to 47 at % favored hardness and Young’s modulus, which rose from 5.8 to 11.23 Gpa and from 90 to 136 Gpa, respectively. XRD analysis and differential scanning calorimetry (DSC) measurements highlighted an improvement of thermal stability with the tantalum addition from 377 to 582 °C when the tantalum content increased from 0 to 31 at %. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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9 pages, 3233 KiB

Open AccessArticle

Transparent Conductive p-Type Cuprous Oxide Films in Vis-NIR Region Prepared by Ion-Beam Assisted DC Reactive Sputtering

by Ming-Jiang Dai, Song-Sheng Lin, Qian Shi, Fen Liu, Wan-Xia Wang, Sheng-Chi Chen, Tsung-Yen Kuo and Hui Sun

Coatings 2020, 10(5), 473; https://doi.org/10.3390/coatings10050473 - 13 May 2020

Cited by 13 | Viewed by 2154

Abstract

Cu₂O thin film has been widely studied due to its intrinsic p-type conductivity. It can be used as p-type transparent conductive electrode or hole transport layer in various potential applications. However, its intrinsic p-type conductivity is very limited, [...] Read more.

Cu₂O thin film has been widely studied due to its intrinsic p-type conductivity. It can be used as p-type transparent conductive electrode or hole transport layer in various potential applications. However, its intrinsic p-type conductivity is very limited, which needs to be optimized by introducing acceptor defects. In this work, the electrical properties of the Cu₂O films was improved through introducing interstitial oxygen in the films those were deposited via direct current sputtering assisted by oxygen ion beam. The results show that with oxygen ion beam current increase, the carrier concentration effectively improves. However, with more interstitial oxygen introduced, the film’s crystallinity significantly reduces, as well as the carrier mobility decreases. Meanwhile, all of the Cu₂O films present moderate transmittance in the visible region (400–800 nm), but ideal transmittance in the near infrared (NIR) light region (800–2500 nm). When compared with the strong reflection of the n-type transparent conductive film to the near infrared light, the Cu₂O film is transparent conductive in NIR region, which expands its application in the fabrication of NIR electrical devices. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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10 pages, 6227 KiB

Open AccessFeature PaperArticle

Pt–Ti Alloy Coatings Deposited by DC Magnetron Sputtering: A Potential Current Collector at High Temperature

by Pascal Briois, Mohammad Arab-Pour-Yazdi, Nicolas Martin and Alain Billard

Coatings 2020, 10(3), 224; https://doi.org/10.3390/coatings10030224 - 01 Mar 2020

Cited by 3 | Viewed by 3112

Abstract

Metallic platinum–titanium coatings were deposited by co-sputtering of two metallic Pt and Ti targets in pure argon atmosphere. The titanium concentrations varied from 0 to 47 atomic percent and were adjusted as a function of the current applied to the titanium target. The [...] Read more.

Metallic platinum–titanium coatings were deposited by co-sputtering of two metallic Pt and Ti targets in pure argon atmosphere. The titanium concentrations varied from 0 to 47 atomic percent and were adjusted as a function of the current applied to the titanium target. The structural and chemical features of these films were assessed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). All as-deposited coatings exhibit a perfect covering of the alumina pellets’ substrate surface. The coatings containing more than 4 at.% Ti are amorphous, whereas the others crystallize in the face-centered cubic (fcc) structure of platinum. After an annealing treatment under air for 2 h, all of the coatings adopt the fcc structure with a crystallization temperature depending on the titanium content. For titanium concentrations higher than 32 at.%, the TiO₂ phase appears during the annealing treatment. For the smaller film thickness of Pt–Ti alloys (15 nm), the Ostwald ripening mechanism is observed by SEM increasing the annealing temperature regardless of the content of Ti. The film resistivity measured at room temperature is lower than 7 × 10⁻⁴ Ω·cm and increases with the temperature to achieve an insulating behavior (in air and reducing atmosphere Ar-H₂ (90-10) at 1123 K the resistivity is ρ ≈ 10⁺³⁶ Ω·cm). When the thickness of intermetallic Pt₃Ti layer is higher than 50 nm, the coating is continuous and the resistivity is below 5 × 10⁻⁴ Ω·cm in air and in reducing atmosphere (Ar with 10% of H₂) up to 1273 K. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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17 pages, 4521 KiB

Open AccessArticle

The Structure, Morphology, and Mechanical Properties of Ta-Hf-C Coatings Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

by Alexis de Monteynard, Huan Luo, Mohamed Chehimi, Jaafar Ghanbaja, Sofiane Achache, Manuel François, Alain Billard and Frédéric Sanchette

Coatings 2020, 10(3), 212; https://doi.org/10.3390/coatings10030212 - 28 Feb 2020

Cited by 12 | Viewed by 2870

Abstract

Ta, Hf, TaC_x, HfC_x, and Ta_xHf_1-xC_y coatings were deposited by reactive pulsed Direct Current (DC) magnetron sputtering of Ta or Hf pure metallic targets in Ar plus CH₄ gas mixtures. The properties have [...] Read more.

Ta, Hf, TaC_x, HfC_x, and Ta_xHf_1-xC_y coatings were deposited by reactive pulsed Direct Current (DC) magnetron sputtering of Ta or Hf pure metallic targets in Ar plus CH₄ gas mixtures. The properties have been investigated as a function of the carbon content, which is tuned via the CH₄ flow rate. The discharge was characterized by means of Optical Emission Spectroscopy and, in our conditions, both Ta-C and Hf-C systems seem to be weakly reactive. The structure of the as-deposited pure tantalum film is metastable tetragonal β-Ta. The fcc-MeC_x carbide phases (Me = Ta or Hf) are {111} textured at low carbon concentrations and then lose their preferred orientation for higher carbon concentrations. Transmission Electron Microscopy (TEM) analysis has highlighted the presence of an amorphous phase at higher carbon concentrations. When the carbon content increases, the coating’s morphology is first compact-columnar and becomes glassy because of the nano-sized grains and then returns to an open columnar morphology for the higher carbon concentrations. The hardness and Young’s modulus of TaC_x coatings reach 36 and 405 GPa, respectively. For HfC_x coatings, these values are 29 and 318 GPa. The MeC_x coating residual stresses increase with the addition of carbon (from one-hundredth of 1 MPa to 1.5 GPa approximately). Nevertheless, the columnar morphology at a high carbon content allows the residual stresses to decrease. Concerning Ta_xHf_1-xC_y coatings, the structure and the microstructure analyses have revealed the creation of a nanostructured coating, with the formation of an fcc superlattice. The hardness is relatively constant independently of the chemical composition (22 GPa). The residual stress was strongly reduced compared to that of binary carbides coatings, due to the rotation of substrates. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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9 pages, 3189 KiB

Open AccessArticle

Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering

by Zhi-Yue Li, Sheng-Chi Chen, Qiu-Hong Huo, Ming-Han Liao, Ming-Jiang Dai, Song-Sheng Lin, Tian-Lin Yang and Hui Sun

Coatings 2019, 9(11), 715; https://doi.org/10.3390/coatings9110715 - 31 Oct 2019

Cited by 6 | Viewed by 3203

Abstract

In-Sn-Zn oxide (ITZO) thin films have been studied as a potential material in flat panel displays due to their high carrier concentration and high mobility. In the current work, ITZO thin films were deposited on glass substrates by high-power impulse magnetron sputtering (HiPIMS) [...] Read more.

In-Sn-Zn oxide (ITZO) thin films have been studied as a potential material in flat panel displays due to their high carrier concentration and high mobility. In the current work, ITZO thin films were deposited on glass substrates by high-power impulse magnetron sputtering (HiPIMS) at room temperature. The influence of the sputtering power on the microstructures and electrical performance of ITZO thin films was investigated. The results show that ITZO thin films prepared by HiPIMS were dense and smooth. There were slight variations in the composition of ITZO thin films deposited at different sputtering powers. With the sputtering power increasing from 100 W to 400 W, the film’s crystallinity was enhanced. When the sputtering power was 400 W, an In₂O₃ (104) plane could be detected. Films with optimal electrical properties were produced at a sputtering power of 300 W, a carrier mobility of 31.25 cm²·V⁻¹·s⁻¹, a carrier concentration of 9.11 × 10¹⁸ cm⁻³, and a resistivity of 2.19 × 10⁻⁴ Ω·m. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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15 pages, 4096 KiB

Open AccessArticle

Texture and Stress Evolution in HfN Films Sputter-Deposited at Oblique Angles

by Grégory Abadias, Fırat Anğay, Rubenson Mareus and Cédric Mastail

Coatings 2019, 9(11), 712; https://doi.org/10.3390/coatings9110712 - 31 Oct 2019

Cited by 20 | Viewed by 4403

Abstract

In this study, polycrystalline hafnium nitride (HfN) thin films were grown by oblique angle deposition (OAD) technique to investigate the relationship between column tilt angle, texture development and residual stress evolution with varying inclination angle α of the substrate. The films (~1 μm [...] Read more.

In this study, polycrystalline hafnium nitride (HfN) thin films were grown by oblique angle deposition (OAD) technique to investigate the relationship between column tilt angle, texture development and residual stress evolution with varying inclination angle α of the substrate. The films (~1 μm thickness) were grown at various angles (α = 5°, 25°, 35°, 65°, 75°, and 85°) with respect to the substrate normal by reactive magnetron sputtering at 0.3 Pa and 300 °C. The film morphology, crystal structure and residual stress state were characterized by scanning electron microscopy and X-ray diffraction (XRD), including pole figure and sin²ψ measurements. All HfN films had a cubic, NaCl-type crystal structure with an [111] out-of-plane orientation and exhibited a biaxial texture for α ≥ 35°. XRD pole figures reveal that the crystal habit of the grains consists of {100} facets constituting triangular-base pyramids, with a side and a corner facing the projection of the incoming particle flux (indicative of a double in-plane alignment). A columnar microstructure was formed for α ≥ 35°, with typical column widths of 100 nm. It is observed that the column tilt angle β increases monotonously for α ≥ 35°, reaching β = 34° at α = 85°. This variation at microscopic scale is correlated with the tilt angle of the (111) crystallographic planes, changing from −24.8 to 11.3° with respect to the substrate surface. The residual stress changes from strongly compressive (~−5 GPa at α = 5°) to negligible or slightly tensile for α ≥ 35°. The observed trends are compared to previous works of the literature and discussed based on existing crystal growth and stress models, as well as in light of energy and angular distribution of the incident particle flux calculated by Monte Carlo. Importantly, a decrease of the average kinetic energy of Hf particles from 22.4 to 17.7 eV is found with increasing α due to an increase number of collisions. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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17 pages, 9113 KiB

Open AccessArticle

Tribological Performance of PVD Film Systems Against Plastic Counterparts for Adhesion-Reducing Application in Injection Molds

by Wolfgang Tillmann, Nelson Filipe Lopes Dias, Dominic Stangier and Nikolai Gelinski

Coatings 2019, 9(9), 588; https://doi.org/10.3390/coatings9090588 - 17 Sep 2019

Cited by 9 | Viewed by 3640

Abstract

The deposition of physical vapor deposition (PVD) hard films is a promising approach to enhance the tribological properties of injection molds in plastic processing. However, the adhesion is influenced by the pairing of PVD film and processed plastic. For this reason, the friction [...] Read more.

The deposition of physical vapor deposition (PVD) hard films is a promising approach to enhance the tribological properties of injection molds in plastic processing. However, the adhesion is influenced by the pairing of PVD film and processed plastic. For this reason, the friction behavior of different PVD films against polyamide, polypropylene, and polystyrene was investigated in tribometer tests by correlating the relation between the roughness and the adhesion. It was shown that the dispersive and polar surface energy have an impact on the work of adhesion. In particular, Cr-based nitrides with a low polar component exhibit the lowest values ranging from 65.5 to 69.4 mN/m when paired with the polar polyamide. An increased roughness leads to a lower friction due to a reduction of the adhesive friction component, whereas a higher work of adhesion results in higher friction for polyamide and polypropylene. Within this context, most Cr-based nitrides exhibited coefficients of friction below 0.4. In contrast, polystyrene leads to a friction-reducing material transfer. Therefore, a customized deposition of the injection molds with an appropriated PVD film system should be carried out according to the processed plastic. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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17 pages, 7291 KiB

Open AccessArticle

Bifunctional TiO₂/AlZr Thin Films on Steel Substrate Combining Corrosion Resistance and Photocatalytic Properties

by Caroline Villardi de Oliveira, Akram Alhussein, Juan Creus, Frédéric Schuster, Michel L. Schlegel, Zhili Dong, Carmen Jiménez and Frédéric Sanchette

Coatings 2019, 9(9), 564; https://doi.org/10.3390/coatings9090564 - 03 Sep 2019

Cited by 8 | Viewed by 3026

Abstract

A novel multi-functional bilayer coating combining an anti-corrosion Al–Zr (4 at.% Zr) underlayer and an anti-biofouling TiO₂ top layer was deposited on high-speed steel (HSS) substrates. Al–Zr (4 at.% Zr) film, deposited by DC magnetron sputtering, which is a single phased supersaturated [...] Read more.

A novel multi-functional bilayer coating combining an anti-corrosion Al–Zr (4 at.% Zr) underlayer and an anti-biofouling TiO₂ top layer was deposited on high-speed steel (HSS) substrates. Al–Zr (4 at.% Zr) film, deposited by DC magnetron sputtering, which is a single phased supersaturated solid solution of Zr in Al, is used to provide sacrificial corrosion resistance of steels and TiO₂ is added as a top layer to induce photocatalytic activity and hydrophilic behavior which can generate antifouling properties in order to slow down the biofouling process. The top TiO₂ films, deposited at 550 °C by AACVD (aerosol-assisted chemical vapor deposition), consisting of anatase TiO₂ microflowers physically attached to the TiO₂ thin films present a high decomposition rate of Orange G dye (780 × 10⁻¹⁰ mol L⁻¹·min⁻¹). The enhanced photocatalytic performance is associated with the rough network and the presence of TiO₂ microflowers capable of supporting the enhanced loading of organic contaminants onto the film surface. Electrochemical tests in saline solution have revealed that bilayer films provide cathodic protection for the steel substrate. The Al–Zr/TiO₂ bilayer presents a lower corrosion current density of 4.01 × 10⁻⁷ A/cm² and a corrosion potential of −0.61 V vs. Ag/AgCl, offering good protection through the preferential oxidation of the bilayer and an increased pitting resistance. The proposed functionalized coating combining anticorrosion and photocatalytic properties is a promising candidate for an anti-fouling system in sea water. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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10 pages, 3473 KiB

Open AccessFeature PaperArticle

Synthesis and Properties of Orthorhombic MoAlB Coatings

by Jan-Ole Achenbach, Rajib Sahu, Bernhard Völker, Marcus Hans, Daniel Primetzhofer, Danilo J. Miljanovic, Christina Scheu and Jochen M. Schneider

Coatings 2019, 9(8), 510; https://doi.org/10.3390/coatings9080510 - 12 Aug 2019

Cited by 20 | Viewed by 4128

Abstract

MoAlB is a potential candidate for high-temperature application since a dense, adherent alumina scale is formed. While, based on X-ray diffraction investigations, the formation of phase pure orthorhombic MoAlB coatings is observed, energy dispersive X-ray spectroscopy carried out in a scanning transmission electron [...] Read more.

MoAlB is a potential candidate for high-temperature application since a dense, adherent alumina scale is formed. While, based on X-ray diffraction investigations, the formation of phase pure orthorhombic MoAlB coatings is observed, energy dispersive X-ray spectroscopy carried out in a scanning transmission electron microscope reveals the presence of Al-rich and O-rich regions within the MoAlB matrix. The oxidation kinetics of coatings and bulk is similar to the scale thickness formed on the MoAlB coating after oxidation at 1200 °C for 30 min is similar to the one extrapolated for bulk MoAlB. Furthermore, the oxidation kinetics of MoAlB coatings is significantly lower than the one reported for bulk Ti₂AlC. Finally, the elastic properties measured for the as-deposited coatings are consistent ab initio predictions. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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Review

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28 pages, 7407 KiB

Open AccessReview

Electrochemical Corrosion of Nano-Structured Magnetron-Sputtered Coatings

by Sebastian Calderon, Cristiana F. Almeida Alves, Noora K. Manninen, Albano Cavaleiro and Sandra Carvalho

Coatings 2019, 9(10), 682; https://doi.org/10.3390/coatings9100682 - 20 Oct 2019

Cited by 22 | Viewed by 5125

Abstract

Magnetron sputtering has been employed for several decades to produce protective and multi-functional coatings, thanks to its versatility and ability to achieve homogeneous layers. Moreover, it is suitable for depositing coatings with very high melting points and that are thermodynamical unstable, which is [...] Read more.

Magnetron sputtering has been employed for several decades to produce protective and multi-functional coatings, thanks to its versatility and ability to achieve homogeneous layers. Moreover, it is suitable for depositing coatings with very high melting points and that are thermodynamical unstable, which is difficult to accomplish by other techniques. Among these types of coating, transition metal (Me) carbides/nitrides (MeC/N) and amorphous carbon (a-C) films are particularly interesting because of the possibility of tailoring their properties by selecting the correct amount of phase fractions, varying from pure MeN, MeC, MeCN to pure a-C phases. This complex phase mixture can be even enhanced by adding a fourth element such Ag, Pt, W, Ti, Si, etc., allowing the production of materials with a large diversity of properties. The mixture of phases, resulting from the immiscibility of phases, allows increasing the number of applications, since each phase can contribute with a specific property such as hardness, self-lubrication, antibacterial ability, to create a multifunctional material. However, the existence of different phases, their fractions variation, the type of transition metal and/or alloying element, can drastically alter the global electrochemical behaviour of these films, with a strong impact on their stability. Consequently, it is imperative to understand how the main features intrinsic to the production process, as well as induced by Me and/or the alloying element, influence the characteristics and properties of the coatings and how these affect their electrochemical behaviour. Therefore, this review will focus on the fundamental aspects of the electrochemical behaviour of magnetron-sputtered films as well as of the substrate/film assembly. Special emphasis will be given to the influence of simulated body fluids on the electrochemical behaviour of coatings. Full article

(This article belongs to the Special Issue Magnetron Sputtering Deposited Thin Films and Its Applications)

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