Plasma Processing of Thin Films, Coatings, and Advanced Materials II

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Plasma Coatings, Surfaces & Interfaces".

Deadline for manuscript submissions: closed (31 December 2023) | Viewed by 383

Special Issue Editors

1. Department of Chemical Engineering and Material Science, Michigan State University, East Lansing, MI 48824, USA
2. Department of Electrical Engineering and Computer Engineering, Michigan State University, East Lansing, MI 48824, USA
Interests: plasma sources; plasma enhanced processing; simulation
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Guest Editor
School of Physics, Beijing Institute of Technology, Beijing 100081, China
Interests: plasma simulation; plasma surface engineering; gas discharge physics; physical vapor deposition; radio frequency discharges; magnetized plasmas

Special Issue Information

Dear Colleagues,

We would like to invite you to submit your work to this Special Issue on "Plasma Processing of Thin Films, Coatings, and Advanced Materials II". Plasma-based surface processing is an important technology for manufacturing thin films, coatings, and advanced materials, which are widely used in the automotive, steel, biomedical, and electronics industries. The use of plasmas can provide activation energy to chemical reactions and additional kinetic energy to adatoms without delivering heat to the substrate surface, thereby providing a highly non-equilibrium environment, which cannot be achieved by conventional surface processing methods. Plasma processing can basically be decoupled into two processes: the influence of process parameters such as the input power, the working pressure, the gas type and flow rate, the electrode geometry, etc., on the plasma parameters such as the plasma density and the electron temperature, and the influence of plasma parameters on the deposition rate and the properties of deposited films or synthesized materials. However, as a rapidly developing technique, it is often difficult to decouple these processes in real applications. Although a complete and in-depth understanding of these mechanisms is still very immature and limited, academic and research institutions around the world have made considerable progress on this topic. The development of new diagnostic and simulation tools has provided strong support for this progress. This Special Issue aims to introduce the latest experimental, computational, and theoretical developments in the field, through a series of original research papers and review articles from leading groups around the world.

In particular, the topics of interest include, but are not limited to:

  • fundamental understanding and new concepts of plasma–surface interactions;
  • novel plasma-based thin film deposition and material synthesis technology;
  • modeling and diagnostic methods of plasma surface processing;
  • implementation of plasma surface processing for research and industrial applications.

Dr. Qihua Fan
Prof. Dr. Bocong Zheng
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma–surface interaction
  • thin film deposition
  • plasma simulation
  • plasma diagnosis
  • plasma surface treatment
  • plasma synthesis

Published Papers

There is no accepted submissions to this special issue at this moment.
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