Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
4.7
3.4
Journals
Coatings
Special Issues
Electrochemically and Electrophoretically Deposited Thin Films and Their Applications
share announcement

Electrochemically and Electrophoretically Deposited Thin Films and Their Applications

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: closed (30 September 2022) | Viewed by 4408

Special Issue Editors

Dr. Elena Pikalova

E-Mail
Guest Editor
Laboratory of Solid Oxide Fuel Cells, Institute of High Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences, Yekaterinburg 620137, Russia;
Department of Environmental Economics, School of Economics and Management, Ural Federal University, Yekaterinburg 620002, Russia
Interests: “green” energy; hydrogen production; solid oxide fuel cells; solid-state electrolytes; electrode kinetics; thin-film technology; nanotechnology; electrophoretic deposition
Dr. Elena Kalinina

E-Mail Website
Guest Editor
1. Laboratory of Complex Electrophysic Investigations, Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Yekaterinburg 620016, Russia
2. Department of Physical and Inorganic Chemistry, Institute of Natural Sciences and Mathematics, Ural Federal University, Yekaterinburg 620002, Russia
Interests: solid oxide fuel cells (SOFC); thin-film technology; electrophoretic deposition (EPD); stable suspensions; nanoscale materials; electrochemical properties
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear colleagues,

We would like to invite you to submit your works to a Special Issue on “Electrochemically and Electrophoretically Deposited Thin Films and their Applications”. A thin film is a layer of material with thickness ranging from fractions of a nanometer to several micrometers. Thin films play an important role in the development and study of materials with new and unique properties. Advances in thin-film deposition techniques have enabled a wide range of technological breakthroughs in many industrial areas. Among the known methods for producing thin-film coatings, the methods of electrochemical and electrophoretic deposition (EPD and ELD) are distinguished by their flexibility of application, the possibility of applying various materials on a complex surface, the low cost of equipment, the ability to obtain films of a given thickness by controlling the deposition parameters and the short timeframe required. The scope of these deposition methods differs significantly – from electrochemical devices, such as fuel cells, batteries, supercapacitors, various sensors and MEMS devices, to thermal protective, hardening and decorative coatings, and even biomolecules, such as enzymes and proteins.

For this Special Issue, we are inviting you to present original papers or reviews on the latest experimental and theoretical developments in the field of electrochemical and electrophoretic deposition of thin-film coatings. Topics of interest for this Special Issue include, but are not limited to the following:

  • Latest theoretical and experimental studies in the field of the formation of thin-film structures by ELD and EPD for energy storage and generation devices
  • Application of ELD and EPD in additive technologies
  • ELD and EPD for the formation of multifunctional organic and inorganic, hybrid, nanostructured coatings using nanoparticles, carbon nanotubes, graphene, polymers, metals, alloys
  • ELD and co-deposition (combined with EPD or other methods) of metal and composite protective coatings
  • Deposition in modulated electric fields
  • New methods of characterization of EPD and ELD thin-film structures.
  • Methods of computer simulation of the processes of formation of thin films and methods for predicting their properties.
  • Novel experimental setups for ELD and EPD

Dr. Elena Pikalova
Dr. Elena Kalinina
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Thin film technology
  • Electrodeposition
  • Electrochemical interface
  • Electrophoretic Deposition
  • Stable suspensions
  • Substrate treatment for deposition
  • Deposition parameters
  • Deposition setup
  • Modulated electric fields
  • Materials and thin-film characterization

Published Papers (2 papers)

Download All Papers
Order results
Result details
Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:

Research

14 pages, 13043 KiB  
Article
The Influence of Sodium Tungstate Concentration on the Electrode Reactions at Iron–Tungsten Alloy Electrodeposition
by Stanislav Belevskii, Serghei Silkin, Natalia Tsyntsaru, Henrikas Cesiulis and Alexandr Dikusar
Coatings 2021, 11(8), 981; https://doi.org/10.3390/coatings11080981 - 18 Aug 2021
Cited by 4 | Viewed by 2260
Abstract
The investigation of Fe-W alloys is growing in comparison to other W alloys with iron group metals due to the environmental and health issues linked to Ni and Co materials. The influence of Na2WO4 concentration in the range 0 to [...] Read more.
The investigation of Fe-W alloys is growing in comparison to other W alloys with iron group metals due to the environmental and health issues linked to Ni and Co materials. The influence of Na2WO4 concentration in the range 0 to 0.5 M on bath chemistry and electrode reactions on Pt in Fe-W alloys’ electrodeposition from citrate electrolyte was investigated by means of rotating disk electrode (RDE) and cyclic voltammetry (CV) synchronized with electrochemical quartz crystal microbalance (EQCM). Depending on species distribution, the formation of Fe-W alloys becomes thermodynamically possible at potentials less than −0.87 V to −0.82 V (vs. Ag/AgCl). The decrease in electrode mass during cathodic current pass in the course of CV recording was detected by EQCM and explained. The overall electrode process involving Fe-W alloy formation may be described using formalities of mixed kinetics. The apparent values of kinetic and diffusion currents linearly depend on the concentration of Na2WO4. Based on the values of partial currents for Fe and W, it was concluded that codeposition of Fe-W alloy is occurring due to an autocatalytic reaction, likely via the formation of mixed adsorbed species containing Fe and W compounds or nucleation clusters containing both metals on the electrode surface. Full article
(This article belongs to the Special Issue Electrochemically and Electrophoretically Deposited Thin Films and Their Applications)
►▼ Show Figures

Figure 1

21 pages, 8067 KiB  
Article
Challenges of Formation of Thin-Film Solid Electrolyte Layers on Non-Conductive Substrates by Electrophoretic Deposition
by Elena Kalinina, Elena Pikalova, Larisa Ermakova and Nina Bogdanovich
Coatings 2021, 11(7), 805; https://doi.org/10.3390/coatings11070805 - 02 Jul 2021
Cited by 12 | Viewed by 2167
Abstract
In this work, the challenges associated with the formation of single and bilayer coatings based on Ce0.8Sm0.2O1.9 (SDC) and CuO modified BaCe0.5Zr0.3Y0.1Yb0.1O3−δ (BCZYYbO-CuO) solid state electrolytes on porous non-conducting [...] Read more.
In this work, the challenges associated with the formation of single and bilayer coatings based on Ce0.8Sm0.2O1.9 (SDC) and CuO modified BaCe0.5Zr0.3Y0.1Yb0.1O3−δ (BCZYYbO-CuO) solid state electrolytes on porous non-conducting NiO-SDC anode substrates by the method of electrophoretic deposition (EPD) are considered. Various approaches that had been selected after analysis of the literature data in order to carry out the EPD, are tested: direct deposition on a porous non-conductive anode substrate and multiple options for creating the conductivity of the anode substrate under EPD conditions such as the reduction of the NiO-SDC substrate and the creation of a surface conducting sublayer via synthesizing a polypyrrole (PPy) film. New effective method was proposed based on the deposition of a platinum layer on the front side of the substrate. It was ascertained that, during the direct EPD on the porous NiO-SDC substrate, the formation of a continuous coating did not occur, which may be due to insufficient porosity of the substrate used. It was shown that the use of reduced substrates leads to cracking and, in some cases, to the destruction of the entire SDC/NiO-SDC structure. The dependence of the electrolyte film sinterability on the substrate shrinkage was studied. In contrast to the literature data, the use of the substrates with a reduced pre-sintering temperature had no pronounced effect on the densification of the SDC electrolyte film. It was revealed that complete sintering of the SDC electrolyte layer with the formation of a developed grain structure is possible at a temperature of 1550 °C. Full article
(This article belongs to the Special Issue Electrochemically and Electrophoretically Deposited Thin Films and Their Applications)
►▼ Show Figures

Graphical abstract

Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:
 
Displaying articles 1-2
Back to TopTop