Ultraviolet Light Research and Fabrication

A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Optics and Lasers".

Deadline for manuscript submissions: closed (31 May 2020) | Viewed by 2909

Special Issue Editors

College of Photonics, National Chiao Tung University, Tainan, Taiwan
Interests: PSS; GaN template; free standing GaN; MOCVD; HVPE; LED; PV
Special Issues, Collections and Topics in MDPI journals
Department of Electrical Engineering, Kun Shan University, Tainan, Taiwan
Interests: deep ultraviolet light measurement; semiconductor optoelectronic components; thin film technology; solid state lighting
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Department of Electro-Optical Engineering, National Taipei University of Technology, Taipei, Taiwan
Interests: epitaxial technology (MOCVD, LPE, and spray methods); compound semiconductors/fabrication and analysis of transparent conducting oxide semiconductors; fabrication of light-emitting diodes; fabrication of solar cells; nanomaterial processes; fabrication of sensor devices; fabrication of perovskite quantum dots; fabrication of perovskite optoelectronic devices (QLEDs, solar cells, and sensors)
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Prof. Dr. Hao-Chung Kuo
E-Mail Website
Guest Editor
Department of Mechanical Engineering, National Chung Cheng University, 62102 ChiaYi, Taiwan
Interests: intelligence biomedical photoelectric; photoelectric semiconductor materials and device; artificial intelligence, intelligence green energy; optical design, opto-mechatronics integrated design; patent layout and analysis
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Graduate Institute of Opto-Mechatronics, National Chung Cheng University, 168 University Rd., Min-Hsiung, Chia-Yi 62102, Taiwan
Interests: biomedical science and engineering; biomedical sensors and images; hyperspectral imaging; optoelectronic semiconductor materials and devices; artificial intelligence
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Special Issue Information

Dear Colleagues,

It is a great pleasure, and an honor, to present this Special Issue of Applied Sciences. This is a feature issue to present recent advances and future prospects of this key, fundamental, research area, especially on deep ultraviolet light and semiconductor exposure equipment.

 You are cordially invited to submit your original research or review papers to this Special Issue. All papers need to present original, previously-unpublished work and will be subject to the normal standards and peer-review processes of this journal.

    Potential topics include, but are not limited to:

  • Ultraviolet light source;
  • Deep ultraviolet light source;
  • Increase of light extraction efficiency;
  • Material of deep ultraviolet light;
  • Increase of ultraviolet epitaxy quality;
  • Ultraviolet epitaxy structure design;
  • Ultraviolet light fabrication;
  • Deep ultraviolet light in biomedical research.

Dr. Zhi Ting Ye
Prof. Cheng-Huang Kuo
Prof. Chun-Liang Lin
Prof. Lung-Chien Chen
Prof. Hao Chung Kuo
Prof. Hsiang-Chen Wang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Ultraviolet light source
  • Deep ultraviolet light source
  • Increase of light extraction efficiency
  • Material of deep ultraviolet light
  • Increase of ultraviolet epitaxy quality
  • Ultraviolet epitaxy structure design
  • Ultraviolet light fabrication
  • Deep ultraviolet light in biomedical research.

Published Papers (1 paper)

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Research

10 pages, 2276 KiB  
Article
Influence of Pre-Ionized Plasma on the Dynamics of a Tin Laser-Triggered Discharge-Plasma
Appl. Sci. 2019, 9(23), 4981; https://doi.org/10.3390/app9234981 - 20 Nov 2019
Cited by 1 | Viewed by 1693
Abstract
The effect of laser-current delay on extreme ultraviolet emission by laser-triggered discharge-plasma has been investigated. Typical waveforms for current, voltage, laser signals, and X-ray signals have been compared. Theoretical tin spectra were simulated among the electron temperature ranges from 10 to 50 eV [...] Read more.
The effect of laser-current delay on extreme ultraviolet emission by laser-triggered discharge-plasma has been investigated. Typical waveforms for current, voltage, laser signals, and X-ray signals have been compared. Theoretical tin spectra were simulated among the electron temperature ranges from 10 to 50 eV to compare with the experimental results. The results show that longer laser-current delay time is propitious to increase the steady-state time of plasma at high temperatures, and it increases the intensity and spectral purity of 13.5 nm emission in 2% band. The 13.5 nm radiation intensity increases about 120% with the delay increasing from 0.7 to 5 μs, and the extreme ultraviolet (EUV) emission conversion efficiency (CE) increases from 0.5% to 1.1%. Full article
(This article belongs to the Special Issue Ultraviolet Light Research and Fabrication)
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