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Editorial

Acknowledgment to the Reviewers of Photochem in 2022

MDPI AG, St. Alban-Anlage 66, 4052 Basel, Switzerland
Photochem 2023, 3(1), 59-60; https://doi.org/10.3390/photochem3010004
Published: 20 January 2023
High-quality academic publishing is built on rigorous peer review. Photochem was able to uphold its high standards for published papers due to the outstanding efforts of our reviewers. Thanks to the efforts of our reviewers in 2022, the median time to first decision was 15 days and the median time to publication was 36 days. Regardless of whether the articles they examined were ultimately published, the editors would like to express their appreciation and thank the following reviewers for the time and dedication that they have shown Photochem:
Adelaide MirandaMargaret Gradova
Ahmed M. El-ZohryMaria Wierzejewska
Aleksandra GrzelakowskaMartin Tsvetkov
Aleksey KuznetsovMassimo Calamante
Alexander S. NovikovMiguel García-Iglesias
Amarendra Narayan MisraMikalai M. Kruk
Anastasia I. SolomatinaMiloslav Machacek
Anca VasileMizuho Fushitani
Andrey V. KustovMohamed A. Ghanem
Anh Vy TranMyong Yong Choi
Anna Cleta CroceNagaraj P. Shetti
Barbara MarchettiNaresh Duvva
Barbara PanunziNatesan Ayyanar
Bogdan SmykNeli Mintcheva
Boris MinaevNikola Basarić
Carlo Maria CarbonaroNikolaos Naziris
Chiara Lo PortoOlga Sacco
Chia-Yun ChenPankaj Raizada
Chih-Wei ChangPantaleo Davide Cozzoli
Chinmaya MahapatraPawan Kumar
Clastinrusselraj I. SathishPramod Borse
Daniel ArandaQi Yu
Dariusz SzczepanikRadosław Podsiadły
Dawid ZychRaquel Agnelli Mesquita Ferrari
Dhritiman BhattacharyyaRobert Kołos
Diego SampedroRobert Zaleśny
Dinesh MedipallyRoman Świetlik
Dmitry B. BerezinRosaria Anna Picca
Ebenezer C. NnadozieRubén Caballero
Emilia L. ApostolovaRuslan E. Asfin
Emiliya V. NosovaRyan Badman
Erzsébet Szabó-BárdosSalvatore Gallo
Evgenia V. SalomatinaSándor Góbi
Ewa KowalskaSandra Milena Leal Pinto
Fazel JahangiriSergey Baykov
Fumiyuki ItoShan Zhou
Gion CalzaferriShin-ichi Ohkoshi
Giovanna D’AngeloShuyun Shi
Girolamo CasellaSivarama Krishna Lakkaboyana
Graham R. FlemingSreed Sharma Kanakkillam
Guan-Ting PanTatiana Tozar
Iker LeónThibault Gallavardin
Ilya G. ShenderovichThirumala Rao Gurugubelli
İsa SıdırTian Zhao
Isabella Natali SoraTianwei He
Islam Md. AminulTomonari Wakabayashi
Ivana PanžićVictor F. Plyusnin
Jandeep SinghVilko Mandić
Jianfeng YeVincenzo Vaiano
Jiangguo ZhangWanhong Ma
Jonas BucevičiusWieslaw Gruszecki
Justyna KrupaXiangjiu Guan
Kaito TakahashiXiaofang Chen
Kolan Madhav ReddyXinghui Liu
Leonard KhalilovYadolah Ganjkhanlou
Longyong ChiangYoshiki Niihori
Madalina CiobanuYuanwei Zhang
Malcolm D. E. ForbesYuerou Zhang
Mamoru Tanaka
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MDPI and ACS Style

Photochem Editorial Office. Acknowledgment to the Reviewers of Photochem in 2022. Photochem 2023, 3, 59-60. https://doi.org/10.3390/photochem3010004

AMA Style

Photochem Editorial Office. Acknowledgment to the Reviewers of Photochem in 2022. Photochem. 2023; 3(1):59-60. https://doi.org/10.3390/photochem3010004

Chicago/Turabian Style

Photochem Editorial Office. 2023. "Acknowledgment to the Reviewers of Photochem in 2022" Photochem 3, no. 1: 59-60. https://doi.org/10.3390/photochem3010004

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