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Journal: Proceedings, 2019
Volume: 14
Number: 27

Article: Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO3), Molybdenum Oxide (MoO3) and Tin Oxide (SnO2) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
Authors: by Engin Ciftyurek, Martin Wilken, David Zanders, Lukas Mai, Anjana Devi and Klaus D. Schierbaum

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